Properties and Mechanism of PEALD-In₂O₃ Thin Films Prepared by Different Precursor Reaction Energy by Ming-Jie Zhao, Zhi-Xuan Zhang, Chia-Hsun Hsu, Xiao-Ying Zhang, Wan-Yu Wu, Shui-Yang Lien, Wen-Zhang Zhu

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Enhanced Si Passivation and PERC Solar Cell Efficiency by Atomic Layer Deposited Aluminum Oxide with Two-step Post Annealing by Chia-Hsun Hsu, Yun-Shao Cho, Wan-Yu Wu, Shui-Yang Lien, Xiao-Ying Zhang, Wen-Zhang Zhu, Sam Zhang, Song-Yan Chen

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Deposition and Characterization of RP-ALD SiO₂ Thin Films with Different Oxygen Plasma Powers by Xiao-Ying Zhang, Yue Yang, Zhi-Xuan Zhang, Xin-Peng Geng, Chia-Hsun Hsu, Wan-Yu Wu, Shui-Yang Lien, Wen-Zhang Zhu

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Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures by Fang-Bin Ren, Shi-Cong Jiang, Chia-Hsun Hsu, Xiao-Ying Zhang, Peng Gao, Wan-Yu Wu, Yi-Jui Chiu, Shui-Yang Lien, Wen-Zhang Zhu

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Crystallinity Effect on Electrical Properties of PEALD–HfO₂ Thin Films Prepared by Different Substrate Temperatures by Xiao-Ying Zhang, Jing Han, Duan-Chen Peng, Yu-Jiao Ruan, Wan-Yu Wu, Dong-Sing Wuu, Chien-Jung Huang, Shui-Yang Lien, Wen-Zhang Zhu

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Role of Ambient Hydrogen in HiPIMS-ITO Film during Annealing Process in a Large Temperature Range by Ming-Jie Zhao, Jin-Fa Zhang, Jie Huang, Zuo-Zhu Chen, An Xie, Wan-Yu Wu, Chien-Jung Huang, Dong-Sing Wuu, Shui-Yang Lien, Wen-Zhang Zhu

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Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO<i>_x</i> Films at Different Substrate Temperatures by Pao-Hsun Huang, Zhi-Xuan Zhang, Chia-Hsun Hsu, Wan-Yu Wu, Sin-Liang Ou, Chien-Jung Huang, Dong-Sing Wuu, Shui-Yang Lien, Wen-Zhang Zhu

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Temperature-Dependent HfO2/Si Interface Structural Evolution and its Mechanism by Xiao-Ying Zhang, Chia-Hsun Hsu, Shui-Yang Lien, Wan-Yu Wu, Sin-Liang Ou, Song-Yan Chen, Wei Huang, Wen-Zhang Zhu, Fei-Bing Xiong, Sam Zhang

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Dielectric properties of hafnium oxide film prepared by HiPIMS at different O2/Ar ratios and their influences on TFT performance by Ming-Jie Zhao, Yao-Tian Wang, Jia-Hao Yan, Hai-Cheng Li, Hua Xu, Dong-Sing Wuu, Wan-Yu Wu, Feng-Min Lai, Shui-Yang Lien, Wen-Zhang Zhu

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Crystal phase control of copper oxide thin films by process pressure during high power impulse magnetron sputtering by Ming-Jie Zhao, Jie Huang, Hai-Cheng Li, Qi-Zhen Chen, Qi-Hui Huang, Wan-Yu Wu, Dong-Sing Wuu, Feng-Min Lai, Shui-Yang Lien, Wen-Zhang Zhu

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Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System by Xiao-Ying Zhang, Chia-Hsun Hsu, Shui-Yang Lien, Song-Yan Chen, Wei Huang, Chih-Hsiang Yang, Chung-Yuan Kung, Wen-Zhang Zhu, Fei-Bing Xiong, Xian-Guo Meng

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Tantalum-Doped TiO₂ Prepared by Atomic Layer Deposition and Its Application in Perovskite Solar Cells by Chia-Hsun Hsu, Ka-Te Chen, Ling-Yan Lin, Wan-Yu Wu, Lu-Sheng Liang, Peng Gao, Yu Qiu, Xiao-Ying Zhang, Pao-Hsun Huang, Shui-Yang Lien, Wen-Zhang Zhu

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Compact Ga₂O₃ Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature by Yue Yang, Xiao-Ying Zhang, Chen Wang, Fang-Bin Ren, Run-Feng Zhu, Chia-Hsun Hsu, Wan-Yu Wu, Dong-Sing Wuu, Peng Gao, Yu-Jiao Ruan, Shui-Yang Lien, Wen-Zhang Zhu

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Effect of Annealing Temperature on Spatial Atomic Layer Deposited Titanium Oxide and Its Application in Perovskite Solar Cells by Chia-Hsun Hsu, Ka-Te Chen, Pao-Hsun Huang, Wan-Yu Wu, Xiao-Ying Zhang, Chen Wang, Lu-Sheng Liang, Peng Gao, Yu Qiu, Shui-Yang Lien, Zhan-Bo Su, Zi-Rong Chen, Wen-Zhang Zhu

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Plasma power effect on crystallinity and density of AlN films deposited by plasma enhanced atomic layer deposition by Xiao-Ying Zhang, Duan-Chen Peng, Jia-Hao Yan, Zhi-Xuan Zhang, Yu-Jiao Ruan, Juan Zuo, An Xie, Wan-Yu Wu, Dong-Sing Wuu, Chien-Jung Huang, Feng-Min Lai, Shui-Yang Lien, Wen-Zhang Zhu

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