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    Design and development of multilayer cotton masks via machine learning

    Design and development of multilayer cotton masks via machine learning by Y. Leow, J.K. Shi, W. Liu, X.P. Ni, P.Y.M. Yew, S. Liu, Z. Li, Y. Xue, D. Kai, X.J. Loh

    Published 2021-12-01
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