Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma by Zhou, H. P., Wei, D. Y., Xu, S., Xiao, S. Q., Xu, L. X., Huang, S. Y., Guo, Y. N., Khan, S., Xu, M.

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Si surface passivation by SiOx : H films deposited by a low-frequency ICP for solar cell applications by Wei, D. Y., Zhou, H. P., Xu, S., Xiao, S. Q., Xu, L. X., Huang, S. Y., Guo, Y. N., Khan, S., Xu, M.

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Amorphous/crystalline silicon heterojunction solar cells via remote inductively coupled plasma processing by Xu, L. X., Xiao, S. Q., Xu, S., Zhou, H. P., Wei, D. Y., Huang, S. Y., Sern, C. C., Guo, Y. N., Khan, S.

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