Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography by Xue Cong, Siliang Zhang, Jiaxing Gao, Xuewen Cui, Yurui Wu, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li, Guoqiang Yang

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