An experimental comparison of interface trap density in hafnium oxide-based FeFETs od Chaiwon Woo, Yannick Raffel, Ricardo Olivo, Konrad Seidel, Aleksander Gurlo

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Improvement of low-frequency noise behavior with chloridic precursor materials at ALD process od Daniel Hessler, Ricardo Olivo, Tim Baldauf, Konrad Seidel, Raik Hoffmann, Chaiwon Woo, Maximilian Lederer, Yannick Raffel

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Ferroelectric Field Effect Transistors–Based Content‐Addressable Storage‐Class Memory: A Study on the Impact of Device Variation and High‐Temperature Compatibility od Athira Sunil, Masud Rana SK, Maximilian Lederer, Yannick Raffel, Franz Müller, Ricardo Olivo, Raik Hoffmann, Konrad Seidel, Thomas Kämpfe, Bhaswar Chakrabarti, Sourav De

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