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  1. 1
    Fast source mask co-optimization method for high-NA EUV lithography

    Fast source mask co-optimization method for high-NA EUV lithography by Ziqi Li, Lisong Dong, Xu Ma, Yayi Wei

    Published 2024-04-01
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    Article
  2. 2
    Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation

    Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation by Dandan Han, Sen Deng, Tianchun Ye, Yayi Wei

    Published 2023-03-01
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    Article

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