Development of very high frequency plasma enhanced chemical vapour deposition for nanostructure silicon carbide thin film deposition / by Muhammad Firdaus Omar, 1986-, author 604327, Abd. Kahmim Ismail, supervisor 604328, Samsudi Sakrani, supervisor 235319, Zulkafli Othaman, supervisor 604300, Yussof Wahab, supervisor 445636, Fakulti Sains 8004