Standard pressure deposition of crack-free AlN buffer layer grown on c-plane sapphire by PALE technique via MOCVD 由 Abd Rahman, Mohd Nazri, Shuhaimi, Ahmad, Yusuf, Yusnizam, Li, Hongjian, Sulaiman, Abdullah Fadil, Alif Samsudin, Muhammad Esmed, Zainal, Norzaini, Abdul Khudus, Muhammad Imran Mustafa