Polymers for high technology : electronics and photonics /

16

Bibliographic Details
Main Authors: Bowden, Murrae J., 1943-, Turner, S. Richard, 1942-
Format:
Published: Washington, D C : American Chemical Society, 1987
Subjects:
_version_ 1796666718892851200
author Bowden, Murrae J., 1943-
Turner, S. Richard, 1942-
author_facet Bowden, Murrae J., 1943-
Turner, S. Richard, 1942-
author_sort Bowden, Murrae J., 1943-
collection OCEAN
description 16
first_indexed 2024-03-04T17:50:37Z
format
id KOHA-OAI-TEST:107380
institution Universiti Teknologi Malaysia - OCEAN
last_indexed 2024-03-04T17:50:37Z
publishDate 1987
publisher Washington, D C : American Chemical Society,
record_format dspace
spelling KOHA-OAI-TEST:1073802020-12-19T17:01:45ZPolymers for high technology : electronics and photonics / Bowden, Murrae J., 1943- Turner, S. Richard, 1942- Washington, D C : American Chemical Society,198716PSZJBLPolymersPhotoresistsMicrolithographyMicroelectronicsURN:ISBN:0841214069
spellingShingle Polymers
Photoresists
Microlithography
Microelectronics
Bowden, Murrae J., 1943-
Turner, S. Richard, 1942-
Polymers for high technology : electronics and photonics /
title Polymers for high technology : electronics and photonics /
title_full Polymers for high technology : electronics and photonics /
title_fullStr Polymers for high technology : electronics and photonics /
title_full_unstemmed Polymers for high technology : electronics and photonics /
title_short Polymers for high technology : electronics and photonics /
title_sort polymers for high technology electronics and photonics
topic Polymers
Photoresists
Microlithography
Microelectronics
work_keys_str_mv AT bowdenmurraej1943 polymersforhightechnologyelectronicsandphotonics
AT turnersrichard1942 polymersforhightechnologyelectronicsandphotonics