Plasma etching of films at high rates /
PSZJBL
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| _version_ | 1796681262565425152 |
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| author | 427147 Heinecke, R. A. H. |
| author_facet | 427147 Heinecke, R. A. H. |
| author_sort | 427147 Heinecke, R. A. H. |
| collection | OCEAN |
| description | PSZJBL |
| first_indexed | 2024-03-04T21:25:32Z |
| format | |
| id | KOHA-OAI-TEST:178837 |
| institution | Universiti Teknologi Malaysia - OCEAN |
| last_indexed | 2024-03-04T21:25:32Z |
| record_format | dspace |
| spelling | KOHA-OAI-TEST:1788372020-12-19T17:04:55ZPlasma etching of films at high rates / 427147 Heinecke, R. A. H. PSZJBLPlasma (Ionized gases)Aluminum film |
| spellingShingle | Plasma (Ionized gases) Aluminum film 427147 Heinecke, R. A. H. Plasma etching of films at high rates / |
| title | Plasma etching of films at high rates / |
| title_full | Plasma etching of films at high rates / |
| title_fullStr | Plasma etching of films at high rates / |
| title_full_unstemmed | Plasma etching of films at high rates / |
| title_short | Plasma etching of films at high rates / |
| title_sort | plasma etching of films at high rates |
| topic | Plasma (Ionized gases) Aluminum film |
| work_keys_str_mv | AT 427147heineckerah plasmaetchingoffilmsathighrates |