Chemically selective, anisotropic plasma etching /
PSZJBL
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_version_ | 1796682296859820032 |
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author | 449300 Bersin, Richard L. |
author_facet | 449300 Bersin, Richard L. |
author_sort | 449300 Bersin, Richard L. |
collection | OCEAN |
description | PSZJBL |
first_indexed | 2024-03-04T21:40:17Z |
format | |
id | KOHA-OAI-TEST:183773 |
institution | Universiti Teknologi Malaysia - OCEAN |
last_indexed | 2024-03-04T21:40:17Z |
record_format | dspace |
spelling | KOHA-OAI-TEST:1837732020-12-19T17:05:06ZChemically selective, anisotropic plasma etching / 449300 Bersin, Richard L. PSZJBLPlasma (Ionized gases)Anisotropy |
spellingShingle | Plasma (Ionized gases) Anisotropy 449300 Bersin, Richard L. Chemically selective, anisotropic plasma etching / |
title | Chemically selective, anisotropic plasma etching / |
title_full | Chemically selective, anisotropic plasma etching / |
title_fullStr | Chemically selective, anisotropic plasma etching / |
title_full_unstemmed | Chemically selective, anisotropic plasma etching / |
title_short | Chemically selective, anisotropic plasma etching / |
title_sort | chemically selective anisotropic plasma etching |
topic | Plasma (Ionized gases) Anisotropy |
work_keys_str_mv | AT 449300bersinrichardl chemicallyselectiveanisotropicplasmaetching |