Applications of reactive plasma practical microelectronic processing systems /
PSZJBL
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author | 449445 Maddox, R. L. Parker, H. L. |
author_facet | 449445 Maddox, R. L. Parker, H. L. |
author_sort | 449445 Maddox, R. L. |
collection | OCEAN |
description | PSZJBL |
first_indexed | 2024-03-04T21:40:22Z |
format | |
id | KOHA-OAI-TEST:183801 |
institution | Universiti Teknologi Malaysia - OCEAN |
last_indexed | 2024-03-04T21:40:22Z |
record_format | dspace |
spelling | KOHA-OAI-TEST:1838012020-12-19T17:05:06ZApplications of reactive plasma practical microelectronic processing systems / 449445 Maddox, R. L. Parker, H. L. PSZJBLPlasma (Ionized gases)Microelectronics |
spellingShingle | Plasma (Ionized gases) Microelectronics 449445 Maddox, R. L. Parker, H. L. Applications of reactive plasma practical microelectronic processing systems / |
title | Applications of reactive plasma practical microelectronic processing systems / |
title_full | Applications of reactive plasma practical microelectronic processing systems / |
title_fullStr | Applications of reactive plasma practical microelectronic processing systems / |
title_full_unstemmed | Applications of reactive plasma practical microelectronic processing systems / |
title_short | Applications of reactive plasma practical microelectronic processing systems / |
title_sort | applications of reactive plasma practical microelectronic processing systems |
topic | Plasma (Ionized gases) Microelectronics |
work_keys_str_mv | AT 449445maddoxrl applicationsofreactiveplasmapracticalmicroelectronicprocessingsystems AT parkerhl applicationsofreactiveplasmapracticalmicroelectronicprocessingsystems |