Applications of reactive plasma practical microelectronic processing systems /

PSZJBL

Bibliographic Details
Main Authors: 449445 Maddox, R. L., Parker, H. L.
Format:
Subjects:
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author 449445 Maddox, R. L.
Parker, H. L.
author_facet 449445 Maddox, R. L.
Parker, H. L.
author_sort 449445 Maddox, R. L.
collection OCEAN
description PSZJBL
first_indexed 2024-03-04T21:40:22Z
format
id KOHA-OAI-TEST:183801
institution Universiti Teknologi Malaysia - OCEAN
last_indexed 2024-03-04T21:40:22Z
record_format dspace
spelling KOHA-OAI-TEST:1838012020-12-19T17:05:06ZApplications of reactive plasma practical microelectronic processing systems / 449445 Maddox, R. L. Parker, H. L. PSZJBLPlasma (Ionized gases)Microelectronics
spellingShingle Plasma (Ionized gases)
Microelectronics
449445 Maddox, R. L.
Parker, H. L.
Applications of reactive plasma practical microelectronic processing systems /
title Applications of reactive plasma practical microelectronic processing systems /
title_full Applications of reactive plasma practical microelectronic processing systems /
title_fullStr Applications of reactive plasma practical microelectronic processing systems /
title_full_unstemmed Applications of reactive plasma practical microelectronic processing systems /
title_short Applications of reactive plasma practical microelectronic processing systems /
title_sort applications of reactive plasma practical microelectronic processing systems
topic Plasma (Ionized gases)
Microelectronics
work_keys_str_mv AT 449445maddoxrl applicationsofreactiveplasmapracticalmicroelectronicprocessingsystems
AT parkerhl applicationsofreactiveplasmapracticalmicroelectronicprocessingsystems