Characterization of plasma etching for semiconductor applications /
PSZJBL
| Main Authors: | , , |
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| Format: | |
| Subjects: |
| _version_ | 1796682398035869696 |
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| author | 451936 Kumar, Rakesh Ladas, Chris Hudson, Gwen |
| author_facet | 451936 Kumar, Rakesh Ladas, Chris Hudson, Gwen |
| author_sort | 451936 Kumar, Rakesh |
| collection | OCEAN |
| description | PSZJBL |
| first_indexed | 2024-03-04T21:41:49Z |
| format | |
| id | KOHA-OAI-TEST:184250 |
| institution | Universiti Teknologi Malaysia - OCEAN |
| last_indexed | 2024-03-04T21:41:49Z |
| record_format | dspace |
| spelling | KOHA-OAI-TEST:1842502020-12-19T17:05:07ZCharacterization of plasma etching for semiconductor applications / 451936 Kumar, Rakesh Ladas, Chris Hudson, Gwen PSZJBLPlasma (Ionized gases) |
| spellingShingle | Plasma (Ionized gases) 451936 Kumar, Rakesh Ladas, Chris Hudson, Gwen Characterization of plasma etching for semiconductor applications / |
| title | Characterization of plasma etching for semiconductor applications / |
| title_full | Characterization of plasma etching for semiconductor applications / |
| title_fullStr | Characterization of plasma etching for semiconductor applications / |
| title_full_unstemmed | Characterization of plasma etching for semiconductor applications / |
| title_short | Characterization of plasma etching for semiconductor applications / |
| title_sort | characterization of plasma etching for semiconductor applications |
| topic | Plasma (Ionized gases) |
| work_keys_str_mv | AT 451936kumarrakesh characterizationofplasmaetchingforsemiconductorapplications AT ladaschris characterizationofplasmaetchingforsemiconductorapplications AT hudsongwen characterizationofplasmaetchingforsemiconductorapplications |