The DryOx process for etching silicon dioxide /
39
| Главные авторы: | , |
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| Формат: | |
| Предметы: |
| _version_ | 1826392622559657984 |
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| author | 449300 Bersin, Richard L. Reichelderfer, Richard F. |
| author_facet | 449300 Bersin, Richard L. Reichelderfer, Richard F. |
| author_sort | 449300 Bersin, Richard L. |
| collection | OCEAN |
| description | 39 |
| first_indexed | 2024-03-04T21:41:54Z |
| format | |
| id | KOHA-OAI-TEST:184275 |
| institution | Universiti Teknologi Malaysia - OCEAN |
| last_indexed | 2024-03-04T21:41:54Z |
| record_format | dspace |
| spelling | KOHA-OAI-TEST:1842752020-12-19T17:05:07ZThe DryOx process for etching silicon dioxide / 449300 Bersin, Richard L. Reichelderfer, Richard F. 39PSZJBLMicroelectronicsSemiconductors |
| spellingShingle | Microelectronics Semiconductors 449300 Bersin, Richard L. Reichelderfer, Richard F. The DryOx process for etching silicon dioxide / |
| title | The DryOx process for etching silicon dioxide / |
| title_full | The DryOx process for etching silicon dioxide / |
| title_fullStr | The DryOx process for etching silicon dioxide / |
| title_full_unstemmed | The DryOx process for etching silicon dioxide / |
| title_short | The DryOx process for etching silicon dioxide / |
| title_sort | dryox process for etching silicon dioxide |
| topic | Microelectronics Semiconductors |
| work_keys_str_mv | AT 449300bersinrichardl thedryoxprocessforetchingsilicondioxide AT reichelderferrichardf thedryoxprocessforetchingsilicondioxide AT 449300bersinrichardl dryoxprocessforetchingsilicondioxide AT reichelderferrichardf dryoxprocessforetchingsilicondioxide |