Modeling of ion implantation in VLSI fabrication process /

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Bibliographic Details
Main Authors: Razali Ismail, 1958-, International Symposium on IC Technology, Systems and Applications (5th : 1993 : Singapore)
Format:
Published: Singapore : [s.n] , 1993
Subjects:
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author Razali Ismail, 1958-
International Symposium on IC Technology, Systems and Applications (5th : 1993 : Singapore)
author_facet Razali Ismail, 1958-
International Symposium on IC Technology, Systems and Applications (5th : 1993 : Singapore)
author_sort Razali Ismail, 1958-
collection OCEAN
description 12
first_indexed 2024-03-04T21:49:04Z
format
id KOHA-OAI-TEST:186579
institution Universiti Teknologi Malaysia - OCEAN
last_indexed 2024-03-04T21:49:04Z
publishDate 1993
publisher Singapore : [s.n] ,
record_format dspace
spelling KOHA-OAI-TEST:1865792020-12-19T17:05:12ZModeling of ion implantation in VLSI fabrication process / Razali Ismail, 1958- International Symposium on IC Technology, Systems and Applications (5th : 1993 : Singapore) Singapore : [s.n] ,199312PSZJBLIon implantationIntegrated circuits
spellingShingle Ion implantation
Integrated circuits
Razali Ismail, 1958-
International Symposium on IC Technology, Systems and Applications (5th : 1993 : Singapore)
Modeling of ion implantation in VLSI fabrication process /
title Modeling of ion implantation in VLSI fabrication process /
title_full Modeling of ion implantation in VLSI fabrication process /
title_fullStr Modeling of ion implantation in VLSI fabrication process /
title_full_unstemmed Modeling of ion implantation in VLSI fabrication process /
title_short Modeling of ion implantation in VLSI fabrication process /
title_sort modeling of ion implantation in vlsi fabrication process
topic Ion implantation
Integrated circuits
work_keys_str_mv AT razaliismail1958 modelingofionimplantationinvlsifabricationprocess
AT internationalsymposiumonictechnologysystemsandapplications5th1993singapore modelingofionimplantationinvlsifabricationprocess