Thin film technology/
16
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New York : Van Nostrand Reinhold,
1968
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_version_ | 1796690346352050176 |
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author | 181467 Berry, Robert W. Hall, Peter M. Harris, Murray T. |
author_facet | 181467 Berry, Robert W. Hall, Peter M. Harris, Murray T. |
author_sort | 181467 Berry, Robert W. |
collection | OCEAN |
description | 16 |
first_indexed | 2024-03-04T23:39:33Z |
format | |
id | KOHA-OAI-TEST:223348 |
institution | Universiti Teknologi Malaysia - OCEAN |
last_indexed | 2024-03-04T23:39:33Z |
publishDate | 1968 |
publisher | New York : Van Nostrand Reinhold, |
record_format | dspace |
spelling | KOHA-OAI-TEST:2233482020-12-19T17:06:38ZThin film technology/ 181467 Berry, Robert W. Hall, Peter M. Harris, Murray T. New York : Van Nostrand Reinhold,196816PSZJBLVapor-platingTantalumMetallic filmsCapacitorsElectric resistorsURN:ISBN:0442007175 |
spellingShingle | Vapor-plating Tantalum Metallic films Capacitors Electric resistors 181467 Berry, Robert W. Hall, Peter M. Harris, Murray T. Thin film technology/ |
title | Thin film technology/ |
title_full | Thin film technology/ |
title_fullStr | Thin film technology/ |
title_full_unstemmed | Thin film technology/ |
title_short | Thin film technology/ |
title_sort | thin film technology |
topic | Vapor-plating Tantalum Metallic films Capacitors Electric resistors |
work_keys_str_mv | AT 181467berryrobertw thinfilmtechnology AT hallpeterm thinfilmtechnology AT harrismurrayt thinfilmtechnology |