Plasma technology in wool /
40
| Main Authors: | , |
|---|---|
| Format: | |
| Language: | eng |
| Published: |
New York, NY : Taylor & Francis,
2007
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| Subjects: |
| _version_ | 1796691666293227520 |
|---|---|
| author | Kan, C. W. C. W. M. Kuen |
| author_facet | Kan, C. W. C. W. M. Kuen |
| author_sort | Kan, C. W. |
| collection | OCEAN |
| description | 40 |
| first_indexed | 2024-03-04T23:57:58Z |
| format | |
| id | KOHA-OAI-TEST:229496 |
| institution | Universiti Teknologi Malaysia - OCEAN |
| language | eng |
| last_indexed | 2024-03-04T23:57:58Z |
| publishDate | 2007 |
| publisher | New York, NY : Taylor & Francis, |
| record_format | dspace |
| spelling | KOHA-OAI-TEST:2294962020-12-19T17:06:54ZPlasma technology in wool / Kan, C. W. C. W. M. Kuen New York, NY : Taylor & Francis,2007eng4012PSZJBLPlasma etchingSemiconductorsURN:ISBN:9780415467452 (pbk.) |
| spellingShingle | Plasma etching Semiconductors Kan, C. W. C. W. M. Kuen Plasma technology in wool / |
| title | Plasma technology in wool / |
| title_full | Plasma technology in wool / |
| title_fullStr | Plasma technology in wool / |
| title_full_unstemmed | Plasma technology in wool / |
| title_short | Plasma technology in wool / |
| title_sort | plasma technology in wool |
| topic | Plasma etching Semiconductors |
| work_keys_str_mv | AT kancw plasmatechnologyinwool AT cwmkuen plasmatechnologyinwool |