Design of MEPCVD system for the preparation of thin film amorphous silicon /

Eitemau Tebyg

• The construction of plasma reactor chamber and radio frequency generator in the RF PECVD system /
  gan: Putut Marwoto, et al.
  Cyhoeddwyd: (1999)
• The optical characterization of hydrogenated amorphous carbon thin films deposited by a DC-PECVD method /
  gan: Suriani Abu Bakar, et al.
  Cyhoeddwyd: (2003)
• Hydrogenated amorphous silicon alloy deposition processes/
  gan: 293806 Luft, Werner, et al.
  Cyhoeddwyd: (1993)
• Plasma techniques for film deposition /
  gan: Konuma, Mitsuharu, 1950-
  Cyhoeddwyd: (2005)
• Carbon Nanotube Growth Using Ni Catalyst in Different Layouts
  gan: Nguyen, H. Q., et al.
  Cyhoeddwyd: (2004)