Simulation of etching process for IC fabrication /

Simulation of etching process for IC fabrication /

Project Paper (Bachelor of Electrical Engineering (Electronics)) - Universiti Teknologi Malaysia, 2003

Bibliographic Details
Main Author:	442678 Wong, Kit Seong
Format:
Language:	eng
Published:	Skudai : Universiti Teknologi Malaysia, 2003
Subjects:	Etching Fabrication

Similar Items

Metasurface Fabrication by Cryogenic and Bosch Deep Reactive Ion Etching
by: Angela M. Baracu, et al.
Published: (2021-04-01)

Simulation of diffusion in ic fabrication process /
by: 251393 Inthrakala Ramakrishnan
Published: (2000)

Simulation of diffusion in ic fabrication process [microfilm] /
by: Inthrakala Ramakrishnan
Published: (2000)

Plasma etching in semiconductor fabrication /
by: 217469 Morgan, Russ A.
Published: (1985)

Reduced Etch Lag and High Aspect Ratios by Deep Reactive Ion Etching (DRIE)
by: Michael S. Gerlt, et al.
Published: (2021-05-01)

Comparison of microleakage on Class V composite restoration: Study on total etch, self etch and selective etch technique
by: Josephine Amanda Karnady, et al.
Published: (2019-01-01)

Optimization of etching processes for the fabrication of smooth silicon carbide membranes for applications in quantum technology
by: Mahsa Mokhtarzadeh, et al.
Published: (2022-08-01)

Etching /
by: 375081 Edmondson, Leonard
Published: (1973)

The versatile technique of RF plasma etching : the etch profile /
by: 427692 Jacob, Adir

Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers
by: Agnieszka Zawadzka, et al.
Published: (2019-01-01)

Modelling the diffusion process in ic fabrication /
by: 432024 Teh, Lee Suan
Published: (2001)

Investigation of a Macromolecular Additive on the Decrease of the Aluminum Horizontal Etching Rate in the Wet Etching Process
by: Jingxiu Ding, et al.
Published: (2022-05-01)

Studies of the chemistry of plasmas used for semiconductor etching
by: Toogood, M, et al.
Published: (1991)

Studies on etching and polymer deposition in halocarbon plasmas
by: Astell-Burt, P, et al.
Published: (1987)

Variation of Bulk Etch Rate and some other Etching Parameters with Etching Temperature for Cellulose Nitrate LR-115 Detector
by: Ali Hussain
Published: (2009-09-01)

Factor Design for the Oxide Etching Process to Reduce Edge Particle Contamination in Capacitively Coupled Plasma Etching Equipment
by: Ching-Ming Ku, et al.
Published: (2022-06-01)

The versatile technique of Rf plasma etching : mechanistic considerations for selective etching /
by: 427692 Jacob, Adir

A statistical method to optimize the chemical etching process of zinc oxide thin films
by: David D. Lynes, et al.
Published: (2022-08-01)

Surface temper etch inspection after grinding
by: 11585 American National Standards Institute, et al.

Etching performance of silicon wafers with redesigned etching drum : An Approach to Etching Optimization /
by: Rozzeta Dolah, author, et al.
Published: (2012)

Comparison of solvent evaporation in the self etch and total etch adhesives in different air draying times
by: Davari Abdolrahim, et al.
Published: (2013-08-01)

EVALUATION OF THE ADHESIVE INTERFACE BETWEEN ENAMEL AND A SINGLE-COMPONENT ADHESIVE APPLIED IN SELF-ETCHING AND SELECTIVE-ETCHING PROCEDURES
by: Gianina Iovan, et al.
Published: (2014-07-01)

Periodic Microstructures Fabricated by Laser Interference with Subsequent Etching
by: Shuang-Ning Yang, et al.
Published: (2020-07-01)

Etching performance of silicon wafers with redesigned etching drum /
by: 186505 Rozzeta Dolah, et al.
Published: (2006)

Fabrication and Characterization of Black GaAs Nanoarrays via ICP Etching
by: Jing Ma, et al.
Published: (2021-01-01)

Fabrication of Submicron Beams with Galvanic Etch Stop for Si in TMAH
by: Yuelin Wang, et al.
Published: (2009-04-01)

Etching performance of silicon wafers with redesigned etching drum [electronic resource] /
by: 186505 Rozzeta Dolah, et al.
Published: (2006)

Anisotropic Etching of InGaN Thin Films with Photoelectrochemical Etching to Form Quantum Dots
by: Xiongliang Wei, et al.
Published: (2023-02-01)

Electrochemical etching processes for the detection of neutrons and radon-decay products
by: Tommasino Luigi
Published: (2004-01-01)

The versatile technique of RF plasma etching : kinetics of etchant formation /
by: 427692 Jacob, Adir

Etching Patterns of Self-Etching Primers in Relation to Shear Bond Strength on Unground Enamel Samples
by: Lorenz Brauchli, et al.
Published: (2021-11-01)

Etching-assisted femtosecond laser modification of hard materials
by: Liu Xue-Qing, et al.
Published: (2019-09-01)

Preparation of MXene-based hybrids and their application in neuromorphic devices
by: Zhuohao Xiao, et al.
Published: (2024-01-01)

Obtaining porous silicon suitable for sensor technology using MacEtch nonelectrolytic etching
by: Iatsunskyi I. R.
Published: (2013-12-01)

The effect of pre-etching with 37% orthophosphoric acid on the shear bond strength of orthodontic brackets bonded using self-etching primer-adhesive system
by: Shaheen Hamdani, et al.
Published: (2016-01-01)

Curvature-Modulated Si Spherical Cap-Like Structure Fabricated by Multistep Ring Edge Etching
by: Tieying Ma, et al.
Published: (2020-08-01)

Fabrication of Partially Etched Polystyrene Nanoparticles
by: In Hwan Jung, et al.
Published: (2023-03-01)

High-Quality Dry Etching of LiNbO<sub>3</sub> Assisted by Proton Substitution through H<sub>2</sub>-Plasma Surface Treatment
by: Arjun Aryal, et al.
Published: (2022-08-01)

Shear bond strength of ceramic and metallic orthodontic brackets bonded with self-etching primer and conventional bonding adhesives
by: Valiollah Arash, et al.
Published: (2017-01-01)

Mapping between two models of etching process
by: T.Patsahan, et al.
Published: (2007-12-01)