Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy /

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Bibliographic Details
Main Author: Cressler, John D.
Format:
Language:eng
Published: Boca Raton, FL : CRC Press, 2006
Subjects:
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author Cressler, John D.
author_facet Cressler, John D.
author_sort Cressler, John D.
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description 16
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institution Universiti Teknologi Malaysia - OCEAN
language eng
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publishDate 2006
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spelling KOHA-OAI-TEST:2818862020-12-19T17:09:08ZSilicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy / Cressler, John D. Boca Raton, FL : CRC Press,2006eng16PSZJBLBipolar transistorsSiliconURN:ISBN:9780849335594 (hbk.)
spellingShingle Bipolar transistors
Silicon
Cressler, John D.
Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy /
title Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy /
title_full Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy /
title_fullStr Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy /
title_full_unstemmed Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy /
title_short Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy /
title_sort silicon heterostructure handbook materials fabrication devices circuits and applications of sige and si strained layer epitaxy
topic Bipolar transistors
Silicon
work_keys_str_mv AT cresslerjohnd siliconheterostructurehandbookmaterialsfabricationdevicescircuitsandapplicationsofsigeandsistrainedlayerepitaxy