Low energy molecule-surface interaction processes of relevance to next-generation fusion devices /
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主要な著者: | , |
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Nagoya, Japan : NIFS,
1996
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_version_ | 1826419637325135872 |
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author | Tawara, H. National Institute for Fusion Science |
author_facet | Tawara, H. National Institute for Fusion Science |
author_sort | Tawara, H. |
collection | OCEAN |
description | 40 |
first_indexed | 2024-03-05T04:19:08Z |
format | |
id | KOHA-OAI-TEST:316463 |
institution | Universiti Teknologi Malaysia - OCEAN |
last_indexed | 2024-03-05T04:19:08Z |
publishDate | 1996 |
publisher | Nagoya, Japan : NIFS, |
record_format | dspace |
spelling | KOHA-OAI-TEST:3164632020-12-19T17:10:39ZLow energy molecule-surface interaction processes of relevance to next-generation fusion devices / Tawara, H. National Institute for Fusion Science Nagoya, Japan : NIFS,199640PSZJBLLow energy electron diffractionNuclear fusion |
spellingShingle | Low energy electron diffraction Nuclear fusion Tawara, H. National Institute for Fusion Science Low energy molecule-surface interaction processes of relevance to next-generation fusion devices / |
title | Low energy molecule-surface interaction processes of relevance to next-generation fusion devices / |
title_full | Low energy molecule-surface interaction processes of relevance to next-generation fusion devices / |
title_fullStr | Low energy molecule-surface interaction processes of relevance to next-generation fusion devices / |
title_full_unstemmed | Low energy molecule-surface interaction processes of relevance to next-generation fusion devices / |
title_short | Low energy molecule-surface interaction processes of relevance to next-generation fusion devices / |
title_sort | low energy molecule surface interaction processes of relevance to next generation fusion devices |
topic | Low energy electron diffraction Nuclear fusion |
work_keys_str_mv | AT tawarah lowenergymoleculesurfaceinteractionprocessesofrelevancetonextgenerationfusiondevices AT nationalinstituteforfusionscience lowenergymoleculesurfaceinteractionprocessesofrelevancetonextgenerationfusiondevices |