Photomask fabrication technology /
16
| Main Authors: | , |
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| Format: | |
| Language: | eng |
| Published: |
New York : McGraw-Hill,
2005
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| Subjects: |
| _version_ | 1796710424189599744 |
|---|---|
| author | 339891 Eynon, Benjamin G. Wu, Banqiu |
| author_facet | 339891 Eynon, Benjamin G. Wu, Banqiu |
| author_sort | 339891 Eynon, Benjamin G. |
| collection | OCEAN |
| description | 16 |
| first_indexed | 2024-03-05T04:21:06Z |
| format | |
| id | KOHA-OAI-TEST:317121 |
| institution | Universiti Teknologi Malaysia - OCEAN |
| language | eng |
| last_indexed | 2024-03-05T04:21:06Z |
| publishDate | 2005 |
| publisher | New York : McGraw-Hill, |
| record_format | dspace |
| spelling | KOHA-OAI-TEST:3171212020-12-19T17:10:40ZPhotomask fabrication technology / 339891 Eynon, Benjamin G. Wu, Banqiu New York : McGraw-Hill,2005eng16PSZJBLIntegrated circuitsMasks (Electronics)MicrolithographyURN:ISBN:0071445633 (hbk.) |
| spellingShingle | Integrated circuits Masks (Electronics) Microlithography 339891 Eynon, Benjamin G. Wu, Banqiu Photomask fabrication technology / |
| title | Photomask fabrication technology / |
| title_full | Photomask fabrication technology / |
| title_fullStr | Photomask fabrication technology / |
| title_full_unstemmed | Photomask fabrication technology / |
| title_short | Photomask fabrication technology / |
| title_sort | photomask fabrication technology |
| topic | Integrated circuits Masks (Electronics) Microlithography |
| work_keys_str_mv | AT 339891eynonbenjaming photomaskfabricationtechnology AT wubanqiu photomaskfabricationtechnology |