Principles of plasma discharges and materials processing /

40

Bibliographic Details
Main Authors: 267989 Lieberman, Michael A., Lichtenberg, Allan J.
Format:
Language:eng
Published: Hoboken, NJ : Wiley-Interscience, 2005
Subjects:
_version_ 1826423558712066048
author 267989 Lieberman, Michael A.
Lichtenberg, Allan J.
author_facet 267989 Lieberman, Michael A.
Lichtenberg, Allan J.
author_sort 267989 Lieberman, Michael A.
collection OCEAN
description 40
first_indexed 2024-03-05T05:18:01Z
format
id KOHA-OAI-TEST:336108
institution Universiti Teknologi Malaysia - OCEAN
language eng
last_indexed 2024-03-05T05:18:01Z
publishDate 2005
publisher Hoboken, NJ : Wiley-Interscience,
record_format dspace
spelling KOHA-OAI-TEST:3361082020-12-19T17:11:23ZPrinciples of plasma discharges and materials processing / 267989 Lieberman, Michael A. Lichtenberg, Allan J. Hoboken, NJ : Wiley-Interscience,2005eng4012PSZJBLPlasma dynamicsThin filmsPlasma etchingPlasma chemistry -- Industrial applicationsURN:ISBN:0471720011 (hbk.)
spellingShingle Plasma dynamics
Thin films
Plasma etching
Plasma chemistry -- Industrial applications
267989 Lieberman, Michael A.
Lichtenberg, Allan J.
Principles of plasma discharges and materials processing /
title Principles of plasma discharges and materials processing /
title_full Principles of plasma discharges and materials processing /
title_fullStr Principles of plasma discharges and materials processing /
title_full_unstemmed Principles of plasma discharges and materials processing /
title_short Principles of plasma discharges and materials processing /
title_sort principles of plasma discharges and materials processing
topic Plasma dynamics
Thin films
Plasma etching
Plasma chemistry -- Industrial applications
work_keys_str_mv AT 267989liebermanmichaela principlesofplasmadischargesandmaterialsprocessing
AT lichtenbergallanj principlesofplasmadischargesandmaterialsprocessing