Principles of plasma discharges and materials processing /
40
| Main Authors: | , |
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| Format: | |
| Language: | eng |
| Published: |
Hoboken, NJ : Wiley-Interscience,
2005
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| Subjects: |
| _version_ | 1826423558712066048 |
|---|---|
| author | 267989 Lieberman, Michael A. Lichtenberg, Allan J. |
| author_facet | 267989 Lieberman, Michael A. Lichtenberg, Allan J. |
| author_sort | 267989 Lieberman, Michael A. |
| collection | OCEAN |
| description | 40 |
| first_indexed | 2024-03-05T05:18:01Z |
| format | |
| id | KOHA-OAI-TEST:336108 |
| institution | Universiti Teknologi Malaysia - OCEAN |
| language | eng |
| last_indexed | 2024-03-05T05:18:01Z |
| publishDate | 2005 |
| publisher | Hoboken, NJ : Wiley-Interscience, |
| record_format | dspace |
| spelling | KOHA-OAI-TEST:3361082020-12-19T17:11:23ZPrinciples of plasma discharges and materials processing / 267989 Lieberman, Michael A. Lichtenberg, Allan J. Hoboken, NJ : Wiley-Interscience,2005eng4012PSZJBLPlasma dynamicsThin filmsPlasma etchingPlasma chemistry -- Industrial applicationsURN:ISBN:0471720011 (hbk.) |
| spellingShingle | Plasma dynamics Thin films Plasma etching Plasma chemistry -- Industrial applications 267989 Lieberman, Michael A. Lichtenberg, Allan J. Principles of plasma discharges and materials processing / |
| title | Principles of plasma discharges and materials processing / |
| title_full | Principles of plasma discharges and materials processing / |
| title_fullStr | Principles of plasma discharges and materials processing / |
| title_full_unstemmed | Principles of plasma discharges and materials processing / |
| title_short | Principles of plasma discharges and materials processing / |
| title_sort | principles of plasma discharges and materials processing |
| topic | Plasma dynamics Thin films Plasma etching Plasma chemistry -- Industrial applications |
| work_keys_str_mv | AT 267989liebermanmichaela principlesofplasmadischargesandmaterialsprocessing AT lichtenbergallanj principlesofplasmadischargesandmaterialsprocessing |