Principles of plasma discharges and materials processing /
40
Main Authors: | , |
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Language: | eng |
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Hoboken, NJ : Wiley-Interscience,
2005
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_version_ | 1826423558712066048 |
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author | 267989 Lieberman, Michael A. Lichtenberg, Allan J. |
author_facet | 267989 Lieberman, Michael A. Lichtenberg, Allan J. |
author_sort | 267989 Lieberman, Michael A. |
collection | OCEAN |
description | 40 |
first_indexed | 2024-03-05T05:18:01Z |
format | |
id | KOHA-OAI-TEST:336108 |
institution | Universiti Teknologi Malaysia - OCEAN |
language | eng |
last_indexed | 2024-03-05T05:18:01Z |
publishDate | 2005 |
publisher | Hoboken, NJ : Wiley-Interscience, |
record_format | dspace |
spelling | KOHA-OAI-TEST:3361082020-12-19T17:11:23ZPrinciples of plasma discharges and materials processing / 267989 Lieberman, Michael A. Lichtenberg, Allan J. Hoboken, NJ : Wiley-Interscience,2005eng4012PSZJBLPlasma dynamicsThin filmsPlasma etchingPlasma chemistry -- Industrial applicationsURN:ISBN:0471720011 (hbk.) |
spellingShingle | Plasma dynamics Thin films Plasma etching Plasma chemistry -- Industrial applications 267989 Lieberman, Michael A. Lichtenberg, Allan J. Principles of plasma discharges and materials processing / |
title | Principles of plasma discharges and materials processing / |
title_full | Principles of plasma discharges and materials processing / |
title_fullStr | Principles of plasma discharges and materials processing / |
title_full_unstemmed | Principles of plasma discharges and materials processing / |
title_short | Principles of plasma discharges and materials processing / |
title_sort | principles of plasma discharges and materials processing |
topic | Plasma dynamics Thin films Plasma etching Plasma chemistry -- Industrial applications |
work_keys_str_mv | AT 267989liebermanmichaela principlesofplasmadischargesandmaterialsprocessing AT lichtenbergallanj principlesofplasmadischargesandmaterialsprocessing |