Principles of plasma discharges and materials processing /
40
Main Authors: | 267989 Lieberman, Michael A., Lichtenberg, Allan J. |
---|---|
Format: | |
Language: | eng |
Published: |
Hoboken, NJ : Wiley-Interscience,
2005
|
Subjects: |
Similar Items
-
Principles of plasma discharges and materials processing /
by: Lieberman, M. A. (Michael A.), et al.
Published: (1994) -
Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /
by: Rossnagel, Stephen M., et al.
Published: (1990) -
Plasma processes for semiconductor fabrication /
by: 414824 Hitchon, W. Nicholas G.
Published: (1999) -
Studies of the chemistry of plasmas used for semiconductor etching
by: Toogood, M, et al.
Published: (1991) -
Studies on etching and polymer deposition in halocarbon plasmas
by: Astell-Burt, P, et al.
Published: (1987)