Principles of plasma discharges and materials processing /

Principles of plasma discharges and materials processing /

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Bibliographic Details
Main Authors:	267989 Lieberman, Michael A., Lichtenberg, Allan J.
Format:
Language:	eng
Published:	Hoboken, NJ : Wiley-Interscience, 2005
Subjects:	Plasma dynamics Thin films Plasma etching Plasma chemistry > Industrial applications

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