The photoelastic effect and its applications /

The photoelastic effect and its applications /

09

Bibliographic Details
Main Authors: Symposium on the Photoelastic Effect and Its Applications (Sept 10-16, 1973 : Belgium), Society for Experimental Stress Analysis (United States), International Union of Theoretical and Applied Mechanics, Permanent Committee for Stress Analysis
Format:
Published: Berlin : Springer-Verlag, 1975
Subjects:
Photoelasticity
Description
Summary:09

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