Atomic layer deposition : principles, characteristics, and nanotechnology applications /

Atomic layer deposition : principles, characteristics, and nanotechnology applications /

Includes bibliographical references and index

Bibliographic Details
Main Author:	Kr̃̃iĩnen, Tommi
Format:
Language:	eng
Published:	Hoboken, New Jersey : John Wiley & Sons, 2013
Subjects:	Chemical vapor deposition Epitaxy Microelectronics Nanotechnology

Similar Items

Nanotechnology : science and computation /
by: Chen, Junghuei, 1960-, et al.
Published: (2006)

Multi-Directional Growth of Aligned Carbon Nanotubes Over Catalyst Film Prepared by Atomic Layer Deposition
by: Zhou Kai, et al.
Published: (2010-01-01)

Handbook of chemical vapor deposition : principles, technology, and applications /
by: 391720 Pierson, Hugh O.
Published: (1999)

Future trends in microelectronics : reflections on the road to nanotechnology /
by: Luryi, Serge, et al.
Published: (1996)

Nanotechnology for microelectronics and optoelectronics /
by: 456032 Martinez-Duart, J. M., et al.
Published: (2006)

Controlled Epitaxial Growth and Atomically Sharp Interface of Graphene/Ferromagnetic Heterostructure via Ambient Pressure Chemical Vapor Deposition
by: Ruinan Wu, et al.
Published: (2021-11-01)

Influence of the nucleation surface on the growth of epitaxial Al2O3 thermal CVD films deposited on cemented carbides
by: Maoxiang Zhu, et al.
Published: (2022-04-01)

Chemical vapour deposition : precursors, processes and applications /
by: Jones, Anthony C., et al.
Published: (2009)

CVD Elaboration of 3C-SiC on AlN/Si Heterostructures: Structural Trends and Evolution during Growth
by: Marc Portail, et al.
Published: (2022-11-01)

One-Step Cost-Effective Growth of High-Quality Epitaxial Ge Films on Si (100) Using a Simplified PECVD Reactor
by: Jignesh Vanjaria, et al.
Published: (2021-10-01)

Heteroepitaxial Growth of T-Nb<sub>2</sub>O<sub>5</sub> on SrTiO<sub>3</sub>
by: Jos E. Boschker, et al.
Published: (2018-11-01)

Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers
by: Nithin Poonkottil, et al.
Published: (2023-03-01)

Silicon earth : introduction to the microelectronics and nanotechnology revolution /
by: 190336 Cressler, John D.
Published: (2009)

Controlled Synthesis of Atomically Layered Hexagonal Boron Nitride via Chemical Vapor Deposition
by: Juanjuan Liu, et al.
Published: (2016-11-01)

The handbook of nanotechnology : business, policy, and intellectual property law /
by: Miller, John C.
Published: (2005)

Deposition polycrystalline diamond on silicon nitride and tungsten carbide by using hot filament chemical vapor deposition /
by: Chee, Kevin Mun Fai, 1985-, et al.
Published: (2009)

Deposition polycrystalline diamond on silicon nitride and tungsten carbide by using hot filament chemical vapor deposition [electronic resource] /
by: Chee, Kevin Mun Fai, 1985-
Published: (2009)

Atomic Layer Deposition of High-k Insulators on Epitaxial Graphene: A Review
by: Filippo Giannazzo, et al.
Published: (2020-04-01)

Chemical vapor deposition technology of black molybdenum spectrally selective surfaces /
by: 290400 Gesheva, K. A., et al.
Published: (c200)

Graphene-on-Insulator Transistors Made Using C on Ni Chemical-Vapor Deposition
by: Keast, Craig L., et al.
Published: (2010)

Controlled synthesis of atomically layered hexagonal boron nitride via chemical vapor deposition
by: Liu, Juanjuan, et al.
Published: (2018)

Organometallic vapor-phase epitaxy : theory and practice /
by: Stringfellow, G. B. (Gerald B.), 1942-
Published: (1999)

The effect of gas compusition of diamond coating on Ti-6A1-4V substrate using chemical vapor deposition method /
by: Teh, Saw Yee, 1988-, et al.
Published: (2012)

Low temperature deposition of hydrogenated nanacrystalline SiC films by helicon wave plasma enhanced chemicam vapor deposition/
by: 496878 Yu, Wei, et al.

The effect of gas compusition of diamond coating on Ti-6A1-4V substrate using chemical vapor deposition method [electronic resources] /
by: Teh, Saw Yee, 1988-
Published: (2012)

The effect of chamber pressure of diamond coating on AISI 304L stainless steel and high speed steel using chemical vapor deposition (CVD) method /
by: Choo, Shyh Jing, 1988-, et al.
Published: (2012)

Future trends in microelectronics : up the nano creek /
by: FTM-5 (2006 : Crete, Greece), et al.
Published: (2007)

Future trends in microelectronics : the nano, the giga, and the ultra /
by: Luryi, Serge, et al.
Published: (2004)

The effect of chamber pressure of diamond coating on AISI 304L stainless steel and high speed steel using chemical vapor deposition (CVD) method [electronic resources] /
by: Choo, Shyh Jing, 1988, et al.
Published: (2012)

Nanotechnology and Nanoscience – From Past Breakthroughs to Future Prospects
by: J. Štremfelj, et al.
Published: (2021-05-01)

Synthesis of zeolite templated graphene (ZTG) from methanol via chemical vapor deposition (CVD) method /
by: Mohd. Syafiq Elias, 1990-, et al.
Published: (2013)

In-Situ Preparation of GaN Sacrificial Layers on Sapphire Substrate in MOVPE Reactor for Self-Separation of the Overgrown GaN Crystal
by: Sepideh Faraji, et al.
Published: (2020-11-01)

Comparison between chemical vapor deposited and physical vapor deposited WSi2 metal gate for InGaAs n-metal-oxide-semiconductor field-effect transistors
by: Ong, B. S., et al.
Published: (2017)

Synthesis of zeolite templated graphene (ZTG) from methanol via chemical vapor deposition (CVD) method [electronic resource] /
by: Mohd. Syafiq Elias, 1990-
Published: (2013)

Formation of MOS-transistors with isolation of active elements by oxiden porous silicon
by: Novosyadlyi S. P., et al.
Published: (2009-06-01)

Overview of thin film deposition techniques
by: Olayinka Oluwatosin Abegunde, et al.
Published: (2019-03-01)

Structural and optical properties of carbon nanowalls by plasma-enhanced chemical vapor deposition method /
by: Noor Fariza Subari, 1990-, author 607039, et al.
Published: (2015)

Structural and optical properties of carbon nanowalls by plasma-enhanced chemical vapor deposition method /
by: Noor Fariza Subari, 1990-, author 607039
Published: (2015)

Preparation of radiation grafted kenaf absorbent for aluminium removal via chemical vapour deposition /
by: Nor Azillah Fatimah Othman, author 1981- 600770, et al.
Published: (2016)

Comparative Study on the Quality of Microcrystalline and Epitaxial Silicon Films Produced by PECVD Using Identical SiF<sub>4</sub> Based Process Conditions
by: Mario Moreno, et al.
Published: (2021-11-01)