Phase change analysis of crystalline silicon thin film grown by very high frequency – plasma enhanced chemical vapour deposition and radio frequency – magnetron sputtering /
| Main Authors: | , , |
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| Format: | text |
| Language: | eng |
| Published: |
Johor Bahru, Johor : Universiti Teknologi Malaysia,
2020
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| Subjects: |
| _version_ | 1796763690958061568 |
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| author | Nor Hariz Kadir Rosman, 1993- author 639627 Muhammad Firdaus Omar, supervisor 373961 Fakulti Sains 8004 |
| author_facet | Nor Hariz Kadir Rosman, 1993- author 639627 Muhammad Firdaus Omar, supervisor 373961 Fakulti Sains 8004 |
| author_sort | Nor Hariz Kadir Rosman, 1993- author 639627 |
| collection | OCEAN |
| description | |
| first_indexed | 2024-03-05T16:59:23Z |
| format | text |
| id | KOHA-OAI-TEST:598147 |
| institution | Universiti Teknologi Malaysia - OCEAN |
| language | eng |
| last_indexed | 2024-03-05T16:59:23Z |
| publishDate | 2020 |
| publisher | Johor Bahru, Johor : Universiti Teknologi Malaysia, |
| record_format | dspace |
| spelling | KOHA-OAI-TEST:5981472023-09-18T02:53:33ZPhase change analysis of crystalline silicon thin film grown by very high frequency – plasma enhanced chemical vapour deposition and radio frequency – magnetron sputtering / Nor Hariz Kadir Rosman, 1993- author 639627 Muhammad Firdaus Omar, supervisor 373961 Fakulti Sains 8004 textJohor Bahru, Johor : Universiti Teknologi Malaysia,2020engIncludes bibliographical references.KK-FSSubjectSubject |
| spellingShingle | Subject Subject Nor Hariz Kadir Rosman, 1993- author 639627 Muhammad Firdaus Omar, supervisor 373961 Fakulti Sains 8004 Phase change analysis of crystalline silicon thin film grown by very high frequency – plasma enhanced chemical vapour deposition and radio frequency – magnetron sputtering / |
| title | Phase change analysis of crystalline silicon thin film grown by very high frequency – plasma enhanced chemical vapour deposition and radio frequency – magnetron sputtering / |
| title_full | Phase change analysis of crystalline silicon thin film grown by very high frequency – plasma enhanced chemical vapour deposition and radio frequency – magnetron sputtering / |
| title_fullStr | Phase change analysis of crystalline silicon thin film grown by very high frequency – plasma enhanced chemical vapour deposition and radio frequency – magnetron sputtering / |
| title_full_unstemmed | Phase change analysis of crystalline silicon thin film grown by very high frequency – plasma enhanced chemical vapour deposition and radio frequency – magnetron sputtering / |
| title_short | Phase change analysis of crystalline silicon thin film grown by very high frequency – plasma enhanced chemical vapour deposition and radio frequency – magnetron sputtering / |
| title_sort | phase change analysis of crystalline silicon thin film grown by very high frequency plasma enhanced chemical vapour deposition and radio frequency magnetron sputtering |
| topic | Subject Subject |
| work_keys_str_mv | AT norharizkadirrosman1993author639627 phasechangeanalysisofcrystallinesiliconthinfilmgrownbyveryhighfrequencyplasmaenhancedchemicalvapourdepositionandradiofrequencymagnetronsputtering AT muhammadfirdausomarsupervisor373961 phasechangeanalysisofcrystallinesiliconthinfilmgrownbyveryhighfrequencyplasmaenhancedchemicalvapourdepositionandradiofrequencymagnetronsputtering AT fakultisains8004 phasechangeanalysisofcrystallinesiliconthinfilmgrownbyveryhighfrequencyplasmaenhancedchemicalvapourdepositionandradiofrequencymagnetronsputtering |