Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
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Westwood, N. J. : Noyes Publications,
1992
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author | 439284 Schmitz, John E. J. |
author_facet | 439284 Schmitz, John E. J. |
author_sort | 439284 Schmitz, John E. J. |
collection | OCEAN |
description | 16 |
first_indexed | 2024-03-04T17:19:48Z |
format | |
id | KOHA-OAI-TEST:97066 |
institution | Universiti Teknologi Malaysia - OCEAN |
last_indexed | 2024-03-04T17:19:48Z |
publishDate | 1992 |
publisher | Westwood, N. J. : Noyes Publications, |
record_format | dspace |
spelling | KOHA-OAI-TEST:970662020-12-19T17:01:19ZChemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications 439284 Schmitz, John E. J. Westwood, N. J. : Noyes Publications,199216PSZJBLIntegrated circuitsTungstenVapor-platingURN:ISBN:0815512880 (hbk.) |
spellingShingle | Integrated circuits Tungsten Vapor-plating 439284 Schmitz, John E. J. Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications |
title | Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications |
title_full | Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications |
title_fullStr | Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications |
title_full_unstemmed | Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications |
title_short | Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications |
title_sort | chemical vapor deposition of tungsten and tungsten silicides for vlsi ulsi applications |
topic | Integrated circuits Tungsten Vapor-plating |
work_keys_str_mv | AT 439284schmitzjohnej chemicalvapordepositionoftungstenandtungstensilicidesforvlsiulsiapplications |