Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications

16

Bibliographic Details
Main Author: 439284 Schmitz, John E. J.
Format:
Published: Westwood, N. J. : Noyes Publications, 1992
Subjects:
_version_ 1796664622421377024
author 439284 Schmitz, John E. J.
author_facet 439284 Schmitz, John E. J.
author_sort 439284 Schmitz, John E. J.
collection OCEAN
description 16
first_indexed 2024-03-04T17:19:48Z
format
id KOHA-OAI-TEST:97066
institution Universiti Teknologi Malaysia - OCEAN
last_indexed 2024-03-04T17:19:48Z
publishDate 1992
publisher Westwood, N. J. : Noyes Publications,
record_format dspace
spelling KOHA-OAI-TEST:970662020-12-19T17:01:19ZChemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications 439284 Schmitz, John E. J. Westwood, N. J. : Noyes Publications,199216PSZJBLIntegrated circuitsTungstenVapor-platingURN:ISBN:0815512880 (hbk.)
spellingShingle Integrated circuits
Tungsten
Vapor-plating
439284 Schmitz, John E. J.
Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
title Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
title_full Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
title_fullStr Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
title_full_unstemmed Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
title_short Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
title_sort chemical vapor deposition of tungsten and tungsten silicides for vlsi ulsi applications
topic Integrated circuits
Tungsten
Vapor-plating
work_keys_str_mv AT 439284schmitzjohnej chemicalvapordepositionoftungstenandtungstensilicidesforvlsiulsiapplications