Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
16
Main Author: | 439284 Schmitz, John E. J. |
---|---|
Format: | |
Published: |
Westwood, N. J. : Noyes Publications,
1992
|
Subjects: |
Similar Items
-
Chemical vapor deposition for microelectronics : principles, technology, and applications /
by: Sherman, Arthur, 1931-
Published: (1987) -
Handbook of chemical vapor deposition : principles, technology, and applications /
by: 391720 Pierson, Hugh O.
Published: (1999) -
Vapor deposition /
by: Powell, Carroll F., et al.
Published: (1966) -
Silicides for VLSI applications /
by: 320164 Murarka, S. P.
Published: (1983) -
The effectiveness various pretreatment for cobalt removal on tungsten carbide /
by: Mohd. Fauzi Mohd. Salleh, 1985-, et al.
Published: (2009)