Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography

Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography

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Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong rel...

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Bibliographic Details
Main Authors: Nurhafizah, Abu Talip, Hayashi, Tatsuya, Taniguchi, Jun, Hiwasa, Shin
Format: Conference or Workshop Item
Language:English
Published: 2015
Subjects:
TK Electrical engineering. Electronics Nuclear engineering
Online Access:http://umpir.ump.edu.my/id/eprint/10471/1/Lifetime%20Prolongation%20of%20Release%20Agent%20on%20Antireflection%20Structure%20Molds%20by%20Means%20of%20Partialfilling%20Ultraviolet%20Nanoimprint%20Lithography.pdf

Internet

http://umpir.ump.edu.my/id/eprint/10471/1/Lifetime%20Prolongation%20of%20Release%20Agent%20on%20Antireflection%20Structure%20Molds%20by%20Means%20of%20Partialfilling%20Ultraviolet%20Nanoimprint%20Lithography.pdf

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