Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography
Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong rel...
| Main Authors: | , , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2015
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| Subjects: | |
| Online Access: | http://umpir.ump.edu.my/id/eprint/10471/1/Lifetime%20Prolongation%20of%20Release%20Agent%20on%20Antireflection%20Structure%20Molds%20by%20Means%20of%20Partialfilling%20Ultraviolet%20Nanoimprint%20Lithography.pdf |