Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system

The photo-polishing of POME over UV /'ZnO photocatalysis system was performed in current study. The ZnO material, with band gap energy of 3.2 eV from our UV-Vis DRS measurement, was proven responsive towards 100 W UV-irradiation of 365 nm wavelength. The effect of ZnO loading was investigated B...

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Príomhchruthaitheoirí: Ng, K. H., Cheng, C. K.
Formáid: Conference or Workshop Item
Teanga:English
Foilsithe / Cruthaithe: 2016
Ábhair:
Rochtain ar líne:http://umpir.ump.edu.my/id/eprint/17069/1/Photo-polishing%20of%20Palm%20Oil%20Mill%20Effluent%20%28POME%29%20over%20UVZnO%20System.pdf
_version_ 1825823621886509056
author Ng, K. H.
Cheng, C. K.
author_facet Ng, K. H.
Cheng, C. K.
author_sort Ng, K. H.
collection UMP
description The photo-polishing of POME over UV /'ZnO photocatalysis system was performed in current study. The ZnO material, with band gap energy of 3.2 eV from our UV-Vis DRS measurement, was proven responsive towards 100 W UV-irradiation of 365 nm wavelength. The effect of ZnO loading was investigated Based on the results obtained, the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal recorded after 240 min of UV irradiation. It is found that all the photomineralization kinetics for all the photoreaction followed the 1st-order reaction with specific reaction rates (k) ranging froml.022 x10-3 to 3.118 x10-3 min-1 • Significantly, the organic removal efficiency was further enhanced when UV exposure was prolonged to 22 h, attaining final readings of 44 ppm of chemical oxygen demand (COD) level.
first_indexed 2024-03-06T12:13:55Z
format Conference or Workshop Item
id UMPir17069
institution Universiti Malaysia Pahang
language English
last_indexed 2024-03-06T12:13:55Z
publishDate 2016
record_format dspace
spelling UMPir170692018-06-29T02:10:06Z http://umpir.ump.edu.my/id/eprint/17069/ Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system Ng, K. H. Cheng, C. K. TP Chemical technology The photo-polishing of POME over UV /'ZnO photocatalysis system was performed in current study. The ZnO material, with band gap energy of 3.2 eV from our UV-Vis DRS measurement, was proven responsive towards 100 W UV-irradiation of 365 nm wavelength. The effect of ZnO loading was investigated Based on the results obtained, the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal recorded after 240 min of UV irradiation. It is found that all the photomineralization kinetics for all the photoreaction followed the 1st-order reaction with specific reaction rates (k) ranging froml.022 x10-3 to 3.118 x10-3 min-1 • Significantly, the organic removal efficiency was further enhanced when UV exposure was prolonged to 22 h, attaining final readings of 44 ppm of chemical oxygen demand (COD) level. 2016 Conference or Workshop Item NonPeerReviewed pdf en http://umpir.ump.edu.my/id/eprint/17069/1/Photo-polishing%20of%20Palm%20Oil%20Mill%20Effluent%20%28POME%29%20over%20UVZnO%20System.pdf Ng, K. H. and Cheng, C. K. (2016) Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system. In: International Conference on Catalysis 2016 (ICAT 2016) , 20-21 September 2016 , Grand Bluewave Hotel, Johor Bahru. p. 1.. (Unpublished) (Unpublished)
spellingShingle TP Chemical technology
Ng, K. H.
Cheng, C. K.
Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system
title Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system
title_full Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system
title_fullStr Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system
title_full_unstemmed Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system
title_short Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system
title_sort photo polishing of palm oil mill effluent pome over uv zno system
topic TP Chemical technology
url http://umpir.ump.edu.my/id/eprint/17069/1/Photo-polishing%20of%20Palm%20Oil%20Mill%20Effluent%20%28POME%29%20over%20UVZnO%20System.pdf
work_keys_str_mv AT ngkh photopolishingofpalmoilmilleffluentpomeoveruvznosystem
AT chengck photopolishingofpalmoilmilleffluentpomeoveruvznosystem