A new factor for fabrication technologies evaluation for silicon nanowire transistors

This paper reviews the fabrication technologies of silicon nanowire transistors (SiNWTs) and rapidly development in this area, as this paper presents various types of SiNWT structures, development of SiNWT properties and different applications until nowadays. This research provides a good comparison...

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Main Authors: Hashim, Yasir, Shakib, Mohammed Nazmus
Format: Article
Language:English
Published: University Ahmad Dahlan (UAD) 2020
Subjects:
Online Access:http://umpir.ump.edu.my/id/eprint/30136/1/12121-46543-1-PB.pdf
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author Hashim, Yasir
Shakib, Mohammed Nazmus
author_facet Hashim, Yasir
Shakib, Mohammed Nazmus
author_sort Hashim, Yasir
collection UMP
description This paper reviews the fabrication technologies of silicon nanowire transistors (SiNWTs) and rapidly development in this area, as this paper presents various types of SiNWT structures, development of SiNWT properties and different applications until nowadays. This research provides a good comparison among fabrication technologies of SiNWTs depending on a new factor DIF, this factor depends on the size of channel and power consumption in channel. As a result of this comparison, the best technology to use in the future to fabricate silicon nano transistors for future ICs is AFM nanolithography.
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spelling UMPir301362020-12-11T06:53:22Z http://umpir.ump.edu.my/id/eprint/30136/ A new factor for fabrication technologies evaluation for silicon nanowire transistors Hashim, Yasir Shakib, Mohammed Nazmus TK Electrical engineering. Electronics Nuclear engineering This paper reviews the fabrication technologies of silicon nanowire transistors (SiNWTs) and rapidly development in this area, as this paper presents various types of SiNWT structures, development of SiNWT properties and different applications until nowadays. This research provides a good comparison among fabrication technologies of SiNWTs depending on a new factor DIF, this factor depends on the size of channel and power consumption in channel. As a result of this comparison, the best technology to use in the future to fabricate silicon nano transistors for future ICs is AFM nanolithography. University Ahmad Dahlan (UAD) 2020-10 Article PeerReviewed pdf en http://umpir.ump.edu.my/id/eprint/30136/1/12121-46543-1-PB.pdf Hashim, Yasir and Shakib, Mohammed Nazmus (2020) A new factor for fabrication technologies evaluation for silicon nanowire transistors. A new factor for fabrication technologies evaluation for silicon nanowire transistors, 18 (5). pp. 2597-2605. ISSN 1693-6930. (Published) http://dx.doi.org/10.12928/telkomnika.v18i5.12121 http://dx.doi.org/10.12928/telkomnika.v18i5.12121
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Hashim, Yasir
Shakib, Mohammed Nazmus
A new factor for fabrication technologies evaluation for silicon nanowire transistors
title A new factor for fabrication technologies evaluation for silicon nanowire transistors
title_full A new factor for fabrication technologies evaluation for silicon nanowire transistors
title_fullStr A new factor for fabrication technologies evaluation for silicon nanowire transistors
title_full_unstemmed A new factor for fabrication technologies evaluation for silicon nanowire transistors
title_short A new factor for fabrication technologies evaluation for silicon nanowire transistors
title_sort new factor for fabrication technologies evaluation for silicon nanowire transistors
topic TK Electrical engineering. Electronics Nuclear engineering
url http://umpir.ump.edu.my/id/eprint/30136/1/12121-46543-1-PB.pdf
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