Low‐dose liquid cell electron microscopy investigation of the complex etching mechanism of rod‐shaped silica colloids

Low‐dose liquid cell electron microscopy investigation of the complex etching mechanism of rod‐shaped silica colloids

Abstract Understanding the chemical structure of rod‐shaped silica colloidal particles is attainable by investigating their etching mechanism in solution. Liquid Cell (Scanning) Transmission Electron Microscopy (LC‐(S)TEM) is a promising technique through which the etching of these particles can be...

書目詳細資料
Main Authors:	Sina Sadighikia, Albert Grau‐Carbonell, Tom A.J. Welling, Ramakrishna Kotni, Fabian Hagemans, Arnout Imhof, Marijn A. van Huis, Alfons van Blaaderen
格式:	Article
語言:	English
出版:	Wiley-VCH 2021-02-01
叢編:	Nano Select
主題:	anisotropic particles etching liquid cell electron microscopy silica
在線閱讀:	https://doi.org/10.1002/nano.202000060

相似書籍

Splay-bend nematic phases of bent colloidal silica rods induced by polydispersity
由: Ramakrishna Kotni, et al.
出版: (2022-12-01)

Modeling, Simulation and Calibration of Silicon Wet Etching
由: Andrzej Kociubiński, et al.
出版: (2023-06-01)

Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes
由: C. A. Hodebourg, et al.
出版: (2001-01-01)

Formation of Black Silicon in a Process of Plasma Etching with Passivation in a SF<sub>6</sub>/O<sub>2</sub> Gas Mixture
由: Andrey Miakonkikh, et al.
出版: (2024-05-01)

Modifying of etching anisotropy of silicon substrates by surface active agents
由: Rola Krzysztof, et al.
出版: (2011-04-01)

Anisotropic etching of 2D layered materials
由: Yuge Zhang, et al.
出版: (2024-10-01)

Anisotropy etching of synthetic diamond single crystals by Pr6O11 powder
由: ZHU Zhendong, et al.
出版: (2022-11-01)

Surface morphology characterization of diamond etched by CeO2
由: CHEN Bing-wei, et al.
出版: (2022-08-01)

Probing Ion Diffusion and Ion Sieving through Hollow Porous Silica Shells by Imaging the Mobility of Colloids Inside the Shells
由: Kanako Watanabe, et al.
出版: (2024-10-01)

Plasma Power Effect on the Surfaces of a Quartz Crystal During Etching using Tetrafluoroethane Gas
由: Masruroh Masruroh, et al.
出版: (2017-12-01)

Smooth or not: Robust fused silica micro-components by femtosecond-laser-assisted etching
由: Remo N. Widmer, et al.
出版: (2021-06-01)

High speed silicon wet anisotropic etching for applications in bulk micromachining: a review
由: Prem Pal, et al.
出版: (2021-02-01)

Etching /
由: 375081 Edmondson, Leonard
出版: (1973)

Low-loss slot waveguides with silicon (111) surfaces realized using anisotropic wet etching
由: Kapil Debnath, et al.
出版: (2016-11-01)

Low loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique
由: Kapil eDebnath, et al.
出版: (2016-02-01)

Improvement of Etching Anisotropy in Fused Silica by Double-Pulse Fabrication
由: Valdemar Stankevič, et al.
出版: (2020-05-01)

The versatile technique of RF plasma etching : the etch profile /
由: 427692 Jacob, Adir

Etching characteristics of Si{110} in 20 wt% KOH with addition of hydroxylamine for the fabrication of bulk micromachined MEMS
由: A. V. Narasimha Rao, et al.
出版: (2017-05-01)

Determination of precise crystallographic directions on Si{111} wafers using self-aligning pre-etched pattern
由: Avvaru Venkata Narasimha Rao, et al.
出版: (2018-06-01)

Fabrication and Characterization of Silicon Micro-Funnels and Tapered Micro-Channels for Stochastic Sensing Applications
由: Frances S. Ligler, et al.
出版: (2008-06-01)

Wet anisotropic etching characteristics of Si{111} in NaOH-based solution for silicon bulk micromachining
由: S. Purohit, et al.
出版: (2022-12-01)

Studies of the chemistry of plasmas used for semiconductor etching
由: Toogood, M, et al.
出版: (1991)

Studies on etching and polymer deposition in halocarbon plasmas
由: Astell-Burt, P, et al.
出版: (1987)

STUDY ABOUT ALUMINIUM ETCHING
由: Botis Mihaela
出版: (2019-03-01)

Variation of Bulk Etch Rate and some other Etching Parameters with Etching Temperature for Cellulose Nitrate LR-115 Detector
由: Ali Hussain
出版: (2009-09-01)

The versatile technique of Rf plasma etching : mechanistic considerations for selective etching /
由: 427692 Jacob, Adir

Formation Mechanism of Rounded SiGe-Etch Front in Isotropic SiGe Plasma Etching for Gate-All-Around FETs
由: Yu Zhao, et al.
出版: (2021-01-01)

Effect of La2O3 etching on the properties of diamond single crystal
由: XIAO Changjiang, et al.
出版: (2023-02-01)

2D phase behaviors of colloidal ellipsoids and rods
由: Huaguang Wang, et al.
出版: (2022-10-01)

Surface temper etch inspection after grinding
由: 11585 American National Standards Institute, et al.

Scaled-Down c-Si and c-SiGe Wagon-Wheels for the Visualization of the Anisotropy and Selectivity of Wet-Chemical Etchants
由: Antoine Pacco, et al.
出版: (2019-08-01)

Different Effective Parameters on the Texturization of Silicon in KOH and IPA Solution and its Hydrophilic behavior
由: morteza maleki, et al.
出版: (2020-03-01)

Fabrication and Characterization of Inverted Silicon Pyramidal Arrays with Randomly Distributed Nanoholes
由: Yue Zhao, et al.
出版: (2021-08-01)

EVALUATION OF THE ADHESIVE INTERFACE BETWEEN ENAMEL AND A SINGLE-COMPONENT ADHESIVE APPLIED IN SELF-ETCHING AND SELECTIVE-ETCHING PROCEDURES
由: Gianina Iovan, et al.
出版: (2014-07-01)

Etching performance of silicon wafers with redesigned etching drum : An Approach to Etching Optimization /
由: Rozzeta Dolah, author, et al.
出版: (2012)

Plasma-free anisotropic selective-area etching of β-Ga2O3 using forming gas under atmospheric pressure
由: Takayoshi Oshima, et al.
出版: (2024-12-01)

Improvement of Laser Damage Resistance of Fused Silica Using Oxygen-Aided Reactive Ion Etching
由: Ting Shao, et al.
出版: (2024-08-01)

Simulation of etching process for IC fabrication /
由: 442678 Wong, Kit Seong
出版: (2003)

Artifacts in metallography: etching pits
由: A. G. Anisovich
出版: (2023-03-01)

Investigation of a Macromolecular Additive on the Decrease of the Aluminum Horizontal Etching Rate in the Wet Etching Process
由: Jingxiu Ding, et al.
出版: (2022-05-01)