Ultra-Stretchable Interconnects for High-Density Stretchable Electronics

The exciting field of stretchable electronics (SE) promises numerous novel applications, particularly in-body and medical diagnostics devices. However, future advanced SE miniature devices will require high-density, extremely stretchable interconnects with micron-scale footprints, which calls for pr...

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Main Authors: Salman Shafqat, Johan P. M. Hoefnagels, Angel Savov, Shivani Joshi, Ronald Dekker, Marc G. D. Geers
Format: Article
Language:English
Published: MDPI AG 2017-09-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/8/9/277
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author Salman Shafqat
Johan P. M. Hoefnagels
Angel Savov
Shivani Joshi
Ronald Dekker
Marc G. D. Geers
author_facet Salman Shafqat
Johan P. M. Hoefnagels
Angel Savov
Shivani Joshi
Ronald Dekker
Marc G. D. Geers
author_sort Salman Shafqat
collection DOAJ
description The exciting field of stretchable electronics (SE) promises numerous novel applications, particularly in-body and medical diagnostics devices. However, future advanced SE miniature devices will require high-density, extremely stretchable interconnects with micron-scale footprints, which calls for proven standardized (complementary metal-oxide semiconductor (CMOS)-type) process recipes using bulk integrated circuit (IC) microfabrication tools and fine-pitch photolithography patterning. Here, we address this combined challenge of microfabrication with extreme stretchability for high-density SE devices by introducing CMOS-enabled, free-standing, miniaturized interconnect structures that fully exploit their 3D kinematic freedom through an interplay of buckling, torsion, and bending to maximize stretchability. Integration with standard CMOS-type batch processing is assured by utilizing the Flex-to-Rigid (F2R) post-processing technology to make the back-end-of-line interconnect structures free-standing, thus enabling the routine microfabrication of highly-stretchable interconnects. The performance and reproducibility of these free-standing structures is promising: an elastic stretch beyond 2000% and ultimate (plastic) stretch beyond 3000%, with <0.3% resistance change, and >10 million cycles at 1000% stretch with <1% resistance change. This generic technology provides a new route to exciting highly-stretchable miniature devices.
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spelling doaj.art-0298817507e04bfab8c3e4ac274f7e812022-12-22T03:49:58ZengMDPI AGMicromachines2072-666X2017-09-018927710.3390/mi8090277mi8090277Ultra-Stretchable Interconnects for High-Density Stretchable ElectronicsSalman Shafqat0Johan P. M. Hoefnagels1Angel Savov2Shivani Joshi3Ronald Dekker4Marc G. D. Geers5Department of Mechanical Engineering, Eindhoven University of Technology, 5600 MB Eindhoven, The NetherlandsDepartment of Mechanical Engineering, Eindhoven University of Technology, 5600 MB Eindhoven, The NetherlandsDepartment of Microelectronics, Delft University of Technology, 2628 CD Delft, The NetherlandsDepartment of Microelectronics, Delft University of Technology, 2628 CD Delft, The NetherlandsDepartment of Microelectronics, Delft University of Technology, 2628 CD Delft, The NetherlandsDepartment of Mechanical Engineering, Eindhoven University of Technology, 5600 MB Eindhoven, The NetherlandsThe exciting field of stretchable electronics (SE) promises numerous novel applications, particularly in-body and medical diagnostics devices. However, future advanced SE miniature devices will require high-density, extremely stretchable interconnects with micron-scale footprints, which calls for proven standardized (complementary metal-oxide semiconductor (CMOS)-type) process recipes using bulk integrated circuit (IC) microfabrication tools and fine-pitch photolithography patterning. Here, we address this combined challenge of microfabrication with extreme stretchability for high-density SE devices by introducing CMOS-enabled, free-standing, miniaturized interconnect structures that fully exploit their 3D kinematic freedom through an interplay of buckling, torsion, and bending to maximize stretchability. Integration with standard CMOS-type batch processing is assured by utilizing the Flex-to-Rigid (F2R) post-processing technology to make the back-end-of-line interconnect structures free-standing, thus enabling the routine microfabrication of highly-stretchable interconnects. The performance and reproducibility of these free-standing structures is promising: an elastic stretch beyond 2000% and ultimate (plastic) stretch beyond 3000%, with <0.3% resistance change, and >10 million cycles at 1000% stretch with <1% resistance change. This generic technology provides a new route to exciting highly-stretchable miniature devices.https://www.mdpi.com/2072-666X/8/9/277stretchable electronicsultra-stretchabilitycomplementary metal-oxide semiconductor (CMOS) processingminiaturized interconnectsmechanical size-effects
spellingShingle Salman Shafqat
Johan P. M. Hoefnagels
Angel Savov
Shivani Joshi
Ronald Dekker
Marc G. D. Geers
Ultra-Stretchable Interconnects for High-Density Stretchable Electronics
Micromachines
stretchable electronics
ultra-stretchability
complementary metal-oxide semiconductor (CMOS) processing
miniaturized interconnects
mechanical size-effects
title Ultra-Stretchable Interconnects for High-Density Stretchable Electronics
title_full Ultra-Stretchable Interconnects for High-Density Stretchable Electronics
title_fullStr Ultra-Stretchable Interconnects for High-Density Stretchable Electronics
title_full_unstemmed Ultra-Stretchable Interconnects for High-Density Stretchable Electronics
title_short Ultra-Stretchable Interconnects for High-Density Stretchable Electronics
title_sort ultra stretchable interconnects for high density stretchable electronics
topic stretchable electronics
ultra-stretchability
complementary metal-oxide semiconductor (CMOS) processing
miniaturized interconnects
mechanical size-effects
url https://www.mdpi.com/2072-666X/8/9/277
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