STUDY OF ELECTROLESS NICKEL PLATING ON RAPID PROTOTYPING MODEL USING ACRYLONITRILE BUTADIENE STYRENE
Electroless plating on Acrylonitrile Butadiene Styrene (ABS) is a metallization process that involves a reduction and oxidation reaction between the nickel source and the substrate material. The purpose of this research is to determine the ability of nickel deposition in the nickel electroless plati...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
University of Brawijaya
2022-06-01
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| Series: | Rekayasa Mesin |
| Subjects: | |
| Online Access: | https://rekayasamesin.ub.ac.id/index.php/rm/article/view/1069 |
| Summary: | Electroless plating on Acrylonitrile Butadiene Styrene (ABS) is a metallization process that involves a reduction and oxidation reaction between the nickel source and the substrate material. The purpose of this research is to determine the ability of nickel deposition in the nickel electroless plating process with a specific etching time variation. This nickel electroless procedure begins with a chromic acid etching process that can last anywhere from 15 to 55 minutes and is useful for increasing roughness and creating submicroscopic cavities. After the etching process is finished, the surface roughness test is performed with a Mitutoyo SJ-210. Additionally, the activation step is carried out for 5 minutes in order for the polymer to become a conductor, allowing the plating process to proceed. The electroless plating process was then carried out for 55 and 75 minutes, with the goal of depositing nickel metal on the ABS surface. The coating results were analyzed using Fourier Transform Infrared (FTIR) spectroscopy IRSpirit/ATR-S serial No. A224158/Shimadzu to determine the functional groups formed both before and after the coating process, X-Ray Diffraction (XRD) to determine the character of the crystal structure, and phase analysis of a solid material using PANalytical type E'xpert Pro, To determine the surface morphology, the Zeiss EVO MA 10 was used to perform scanning electron microscopy-energy dispersive X-ray spectroscopy (SEM-EDS) at 1000x magnification. The test findings demonstrate that, based on a range of investigations, etching variations of 15,25,35,45, and 55 minutes etching time 55 minutes are the best nickel deposited substrates, as evidenced by EDS data, where this treatment has the largest weight fraction of nickel. As a result, the longer the etching period, the rougher the surface becomes, affecting the capacity of nickel deposition to increase. Furthermore, it can be demonstrated in this investigation that the nickel deposited is in an amorphous form. |
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| ISSN: | 2338-1663 2477-6041 |