Single-Mode Tapered Vertical SU-8 Waveguide Fabricated by E-Beam Lithography for Analyte Sensing
In this paper, we propose a novel vertical SU-8 waveguide for evanescent analyte sensing. The waveguide is designed to possess a vertical and narrow structure to generate evanescent waves on both sides of the waveguide’s surface, aimed at increasing the sensitivity by enlarging the sensing...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
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MDPI AG
2019-08-01
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| Series: | Sensors |
| Subjects: | |
| Online Access: | https://www.mdpi.com/1424-8220/19/15/3383 |
| _version_ | 1798041506506866688 |
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| author | Yu Xin Gregory Pandraud Yongmeng Zhang Paddy French |
| author_facet | Yu Xin Gregory Pandraud Yongmeng Zhang Paddy French |
| author_sort | Yu Xin |
| collection | DOAJ |
| description | In this paper, we propose a novel vertical SU-8 waveguide for evanescent analyte sensing. The waveguide is designed to possess a vertical and narrow structure to generate evanescent waves on both sides of the waveguide’s surface, aimed at increasing the sensitivity by enlarging the sensing areas. We performed simulations to monitor the influence of different parameters on the waveguide’s performance, including its height and width. E-beam lithography was used to fabricate the structure, as this one-step direct writing process enables easy, fast, and high-resolution fabrication. Furthermore, it reduces the sidewall roughness and decreases the induced scattering loss, which is a major source of waveguide loss. Couplers were added to improve the coupling efficiency and alignment tolerance, and will contribute to the feasibility of a plug-and-play optical system. Optical measurements show that the transmission loss is 1.03 ± 0.19 dB/cm. The absorption sensitivity was measured to be 4.8 dB per refractive index unit (dB/RIU) for saline solutions with various concentrations. |
| first_indexed | 2024-04-11T22:22:28Z |
| format | Article |
| id | doaj.art-0532e9ed523b4bae9c481f5b35be387d |
| institution | Directory Open Access Journal |
| issn | 1424-8220 |
| language | English |
| last_indexed | 2024-04-11T22:22:28Z |
| publishDate | 2019-08-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Sensors |
| spelling | doaj.art-0532e9ed523b4bae9c481f5b35be387d2022-12-22T03:59:59ZengMDPI AGSensors1424-82202019-08-011915338310.3390/s19153383s19153383Single-Mode Tapered Vertical SU-8 Waveguide Fabricated by E-Beam Lithography for Analyte SensingYu Xin0Gregory Pandraud1Yongmeng Zhang2Paddy French3State Key Laboratory of NBC Protection for Civilian, Beijing 102205, ChinaEEMCS, Delft University of Technology, 2628 CD Delft, The NetherlandsCollege of Intelligence Science and Technology, National University of Defense Technology, Changsha 410073, ChinaEEMCS, Delft University of Technology, 2628 CD Delft, The NetherlandsIn this paper, we propose a novel vertical SU-8 waveguide for evanescent analyte sensing. The waveguide is designed to possess a vertical and narrow structure to generate evanescent waves on both sides of the waveguide’s surface, aimed at increasing the sensitivity by enlarging the sensing areas. We performed simulations to monitor the influence of different parameters on the waveguide’s performance, including its height and width. E-beam lithography was used to fabricate the structure, as this one-step direct writing process enables easy, fast, and high-resolution fabrication. Furthermore, it reduces the sidewall roughness and decreases the induced scattering loss, which is a major source of waveguide loss. Couplers were added to improve the coupling efficiency and alignment tolerance, and will contribute to the feasibility of a plug-and-play optical system. Optical measurements show that the transmission loss is 1.03 ± 0.19 dB/cm. The absorption sensitivity was measured to be 4.8 dB per refractive index unit (dB/RIU) for saline solutions with various concentrations.https://www.mdpi.com/1424-8220/19/15/3383SU-8 photoresistvertical waveguidesingle-modeevanescent sensingE-beam lithographytaper |
| spellingShingle | Yu Xin Gregory Pandraud Yongmeng Zhang Paddy French Single-Mode Tapered Vertical SU-8 Waveguide Fabricated by E-Beam Lithography for Analyte Sensing Sensors SU-8 photoresist vertical waveguide single-mode evanescent sensing E-beam lithography taper |
| title | Single-Mode Tapered Vertical SU-8 Waveguide Fabricated by E-Beam Lithography for Analyte Sensing |
| title_full | Single-Mode Tapered Vertical SU-8 Waveguide Fabricated by E-Beam Lithography for Analyte Sensing |
| title_fullStr | Single-Mode Tapered Vertical SU-8 Waveguide Fabricated by E-Beam Lithography for Analyte Sensing |
| title_full_unstemmed | Single-Mode Tapered Vertical SU-8 Waveguide Fabricated by E-Beam Lithography for Analyte Sensing |
| title_short | Single-Mode Tapered Vertical SU-8 Waveguide Fabricated by E-Beam Lithography for Analyte Sensing |
| title_sort | single mode tapered vertical su 8 waveguide fabricated by e beam lithography for analyte sensing |
| topic | SU-8 photoresist vertical waveguide single-mode evanescent sensing E-beam lithography taper |
| url | https://www.mdpi.com/1424-8220/19/15/3383 |
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