| Summary: | High frequency supercapacitors (HFSCs) are promising in alternating current line filtering and adaptable storage of high-frequency pulse electrical energy. Herein, we report a facile yet integrated-circuit-compatible fabrication of HFSC electrodes by combining chemical roughening of the sputtered metal (Au) films and in situ trace loading of a pseudocapacitive material (MnO<i><sub>x</sub></i>). The developed electrode fabrication route is versatile for different substrates, and is described with the application paradigms of both on-chip (with Si/SiO<sub>2</sub> substrate) and off-chip (without Si/SiO<sub>2</sub> substrate, with Ti substrate as an example in this study) HFSCs. With Au/MnO<i><sub>x</sub></i> films on Si/SiO<sub>2</sub> substrates as the working electrodes, the derived on-chip HFSC displayed satisfactory performance in high frequency applications (i.e., an areal capacitance of 131.7 µF cm<sup>−2</sup>, a phase angle of −78°, and a RC time constant of 0.27 ms, at 120 Hz).
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