Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al<sub>2</sub>O<sub>3</sub> Film Growth
In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al<sub>2</sub>O<sub>3</sub> thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced. Utilizing ex situ PAW achiev...
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| Format: | Article |
| Language: | English |
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MDPI AG
2023-12-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/13/24/3110 |
| _version_ | 1797379824353804288 |
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| author | João Chaves William Chiappim Júlia Karnopp Benedito Neto Douglas Leite Argemiro da Silva Sobrinho Rodrigo Pessoa |
| author_facet | João Chaves William Chiappim Júlia Karnopp Benedito Neto Douglas Leite Argemiro da Silva Sobrinho Rodrigo Pessoa |
| author_sort | João Chaves |
| collection | DOAJ |
| description | In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al<sub>2</sub>O<sub>3</sub> thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced. Utilizing ex situ PAW achieves up to a 16.4% increase in the growth per cycle (GPC) of Al<sub>2</sub>O<sub>3</sub> films, consistent with results from plasma-enhanced atomic layer deposition (PEALD). Time-resolved mass spectrometry (TRMS) revealed disparities in CH<sub>4</sub> partial pressures between TMA reactions with DI water and PAW, with PAW demonstrating enhanced reactivity. Reactive oxygen species (ROS), namely H<sub>2</sub>O<sub>2</sub> and O<sub>3</sub>, are posited to activate Si(100) substrate sites, thereby improving GPC and film quality. Specifically, Al<sub>2</sub>O<sub>3</sub> films grown with PAW pH = 3.1 displayed optimal stoichiometry, reduced carbon content, and an expanded bandgap. This study thus establishes “PAW-ALD” as a descriptor for this ALD variation and highlights the significance of comprehensive assessments of PAW in ALD processes. |
| first_indexed | 2024-03-08T20:28:37Z |
| format | Article |
| id | doaj.art-06b464ebbb19403882106942e4b9702f |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-03-08T20:28:37Z |
| publishDate | 2023-12-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-06b464ebbb19403882106942e4b9702f2023-12-22T14:29:05ZengMDPI AGNanomaterials2079-49912023-12-011324311010.3390/nano13243110Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al<sub>2</sub>O<sub>3</sub> Film GrowthJoão Chaves0William Chiappim1Júlia Karnopp2Benedito Neto3Douglas Leite4Argemiro da Silva Sobrinho5Rodrigo Pessoa6Laboratório de Plasmas e Processos, Departamento de Física, Instituto Tecnológico de Aeronáutica, Praça Marechal Eduardo Gomes 50, São José dos Campos 12228-900, BrazilLaboratório de Plasmas e Aplicações, Departamento de Física, Faculdade de Engenharia de Guaratinguetá, São Paulo State University (UNESP), Guaratinguetá 12516-410, BrazilLaboratório de Plasmas e Processos, Departamento de Física, Instituto Tecnológico de Aeronáutica, Praça Marechal Eduardo Gomes 50, São José dos Campos 12228-900, BrazilLaboratório de Plasmas e Processos, Departamento de Física, Instituto Tecnológico de Aeronáutica, Praça Marechal Eduardo Gomes 50, São José dos Campos 12228-900, BrazilLaboratório de Plasmas e Processos, Departamento de Física, Instituto Tecnológico de Aeronáutica, Praça Marechal Eduardo Gomes 50, São José dos Campos 12228-900, BrazilLaboratório de Plasmas e Processos, Departamento de Física, Instituto Tecnológico de Aeronáutica, Praça Marechal Eduardo Gomes 50, São José dos Campos 12228-900, BrazilLaboratório de Plasmas e Processos, Departamento de Física, Instituto Tecnológico de Aeronáutica, Praça Marechal Eduardo Gomes 50, São José dos Campos 12228-900, BrazilIn the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al<sub>2</sub>O<sub>3</sub> thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced. Utilizing ex situ PAW achieves up to a 16.4% increase in the growth per cycle (GPC) of Al<sub>2</sub>O<sub>3</sub> films, consistent with results from plasma-enhanced atomic layer deposition (PEALD). Time-resolved mass spectrometry (TRMS) revealed disparities in CH<sub>4</sub> partial pressures between TMA reactions with DI water and PAW, with PAW demonstrating enhanced reactivity. Reactive oxygen species (ROS), namely H<sub>2</sub>O<sub>2</sub> and O<sub>3</sub>, are posited to activate Si(100) substrate sites, thereby improving GPC and film quality. Specifically, Al<sub>2</sub>O<sub>3</sub> films grown with PAW pH = 3.1 displayed optimal stoichiometry, reduced carbon content, and an expanded bandgap. This study thus establishes “PAW-ALD” as a descriptor for this ALD variation and highlights the significance of comprehensive assessments of PAW in ALD processes.https://www.mdpi.com/2079-4991/13/24/3110plasma-activated wateratomic layer depositionaluminagrowth per cycle |
| spellingShingle | João Chaves William Chiappim Júlia Karnopp Benedito Neto Douglas Leite Argemiro da Silva Sobrinho Rodrigo Pessoa Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al<sub>2</sub>O<sub>3</sub> Film Growth Nanomaterials plasma-activated water atomic layer deposition alumina growth per cycle |
| title | Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al<sub>2</sub>O<sub>3</sub> Film Growth |
| title_full | Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al<sub>2</sub>O<sub>3</sub> Film Growth |
| title_fullStr | Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al<sub>2</sub>O<sub>3</sub> Film Growth |
| title_full_unstemmed | Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al<sub>2</sub>O<sub>3</sub> Film Growth |
| title_short | Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al<sub>2</sub>O<sub>3</sub> Film Growth |
| title_sort | novel energetic co reactant for thermal oxide atomic layer deposition the impact of plasma activated water on al sub 2 sub o sub 3 sub film growth |
| topic | plasma-activated water atomic layer deposition alumina growth per cycle |
| url | https://www.mdpi.com/2079-4991/13/24/3110 |
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