Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al<sub>2</sub>O<sub>3</sub> Film Growth

Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al<sub>2</sub>O<sub>3</sub> Film Growth

In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al<sub>2</sub>O<sub>3</sub> thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced. Utilizing ex situ PAW achiev...

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Bibliographic Details
Main Authors:	João Chaves, William Chiappim, Júlia Karnopp, Benedito Neto, Douglas Leite, Argemiro da Silva Sobrinho, Rodrigo Pessoa
Format:	Article
Language:	English
Published:	MDPI AG 2023-12-01
Series:	Nanomaterials
Subjects:	plasma-activated water atomic layer deposition alumina growth per cycle
Online Access:	https://www.mdpi.com/2079-4991/13/24/3110

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