Features of Metalorganic Chemical Vapor Deposition Selective Area Epitaxy of Al<sub>z</sub>Ga<sub>1−z</sub>As (0 ≤ <i>z</i> ≤ 0.3) Layers in Arrays of Ultrawide Windows

Features of Metalorganic Chemical Vapor Deposition Selective Area Epitaxy of Al<sub>z</sub>Ga<sub>1−z</sub>As (0 ≤ <i>z</i> ≤ 0.3) Layers in Arrays of Ultrawide Windows

Al<sub>z</sub>Ga<sub>1−z</sub>As layers of various compositions were grown using metalorganic chemical vapor deposition on a GaAs substrate with a pattern of alternating SiO<sub>2</sub> mask/window stripes, each 100 µm wide. Microphotoluminescence maps and thickne...

Full description

Bibliographic Details
Main Authors: Viktor Shamakhov, Sergey Slipchenko, Dmitriy Nikolaev, Ilya Soshnikov, Alexander Smirnov, Ilya Eliseyev, Artyom Grishin, Matvei Kondratov, Artem Rizaev, Nikita Pikhtin, Peter Kop’ev
Format: Article
Language:English
Published: MDPI AG 2023-07-01
Series:Technologies
Subjects:
selective area epitaxy
mocvd
AlGaAs
photoluminescence
profilometry
Online Access:https://www.mdpi.com/2227-7080/11/4/89

Internet

https://www.mdpi.com/2227-7080/11/4/89

Similar Items