Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition
We investigated the effects of chromium (Cr) and niobium (Nb) co-doping on the temperature coefficient of resistance (TCR) and the thermal hysteresis of the metal–insulator transition of vanadium dioxide (VO2) films. We determined the TCR and thermal-hysteresis-width diagram of the V1−x−yCrxNbyO2 fi...
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| Format: | Article |
| Language: | English |
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AIP Publishing LLC
2016-05-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4949757 |
| _version_ | 1819149306693681152 |
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| author | Kenichi Miyazaki Keisuke Shibuya Megumi Suzuki Kenichi Sakai Jun-ichi Fujita Akihito Sawa |
| author_facet | Kenichi Miyazaki Keisuke Shibuya Megumi Suzuki Kenichi Sakai Jun-ichi Fujita Akihito Sawa |
| author_sort | Kenichi Miyazaki |
| collection | DOAJ |
| description | We investigated the effects of chromium (Cr) and niobium (Nb) co-doping on the temperature coefficient of resistance (TCR) and the thermal hysteresis of the metal–insulator transition of vanadium dioxide (VO2) films. We determined the TCR and thermal-hysteresis-width diagram of the V1−x−yCrxNbyO2 films by electrical-transport measurements and we found that the doping conditions x ≳ y and x + y ≥ 0.1 are appropriate for simultaneously realizing a large TCR value and an absence of thermal hysteresis in the films. By using these findings, we developed a V0.90Cr0.06Nb0.04O2 film grown on a TiO2-buffered SiO2/Si substrate that showed practically no thermal hysteresis while retaining a large TCR of 11.9%/K. This study has potential applications in the development of VO2-based uncooled bolometers. |
| first_indexed | 2024-12-22T13:59:31Z |
| format | Article |
| id | doaj.art-096028ff29aa41b09960a13241978566 |
| institution | Directory Open Access Journal |
| issn | 2158-3226 |
| language | English |
| last_indexed | 2024-12-22T13:59:31Z |
| publishDate | 2016-05-01 |
| publisher | AIP Publishing LLC |
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| series | AIP Advances |
| spelling | doaj.art-096028ff29aa41b09960a132419785662022-12-21T18:23:26ZengAIP Publishing LLCAIP Advances2158-32262016-05-0165055012055012-710.1063/1.4949757037605ADVChromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transitionKenichi Miyazaki0Keisuke Shibuya1Megumi Suzuki2Kenichi Sakai3Jun-ichi Fujita4Akihito Sawa5Denso Corporation, Aichi 470-0111, JapanNational Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, JapanDenso Corporation, Aichi 470-0111, JapanDenso Corporation, Aichi 470-0111, JapanUniversity of Tsukuba, Tsukuba 305-8571, JapanNational Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, JapanWe investigated the effects of chromium (Cr) and niobium (Nb) co-doping on the temperature coefficient of resistance (TCR) and the thermal hysteresis of the metal–insulator transition of vanadium dioxide (VO2) films. We determined the TCR and thermal-hysteresis-width diagram of the V1−x−yCrxNbyO2 films by electrical-transport measurements and we found that the doping conditions x ≳ y and x + y ≥ 0.1 are appropriate for simultaneously realizing a large TCR value and an absence of thermal hysteresis in the films. By using these findings, we developed a V0.90Cr0.06Nb0.04O2 film grown on a TiO2-buffered SiO2/Si substrate that showed practically no thermal hysteresis while retaining a large TCR of 11.9%/K. This study has potential applications in the development of VO2-based uncooled bolometers.http://dx.doi.org/10.1063/1.4949757 |
| spellingShingle | Kenichi Miyazaki Keisuke Shibuya Megumi Suzuki Kenichi Sakai Jun-ichi Fujita Akihito Sawa Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition AIP Advances |
| title | Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition |
| title_full | Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition |
| title_fullStr | Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition |
| title_full_unstemmed | Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition |
| title_short | Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition |
| title_sort | chromium niobium co doped vanadium dioxide films large temperature coefficient of resistance and practically no thermal hysteresis of the metal insulator transition |
| url | http://dx.doi.org/10.1063/1.4949757 |
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