Annealing temperature induced improved crystallinity of YSZ thin film
Six YSZ thin films (YSZTFs) were prepared at varied annealing temperature (380 °C to 600 °C) by radio frequency magnetron sputtering method. Glancing angle x-ray diffraction (GAXRD) pattern revealed the polycrystalline nature of all films with crystallite size in the range of 9 to 15 nm. Sample anne...
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Format: | Article |
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IOP Publishing
2020-01-01
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Series: | Materials Research Express |
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Online Access: | https://doi.org/10.1088/2053-1591/ab9039 |
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author | N A Rusli R Muhammad S K Ghoshal H Nur N Nayan |
author_facet | N A Rusli R Muhammad S K Ghoshal H Nur N Nayan |
author_sort | N A Rusli |
collection | DOAJ |
description | Six YSZ thin films (YSZTFs) were prepared at varied annealing temperature (380 °C to 600 °C) by radio frequency magnetron sputtering method. Glancing angle x-ray diffraction (GAXRD) pattern revealed the polycrystalline nature of all films with crystallite size in the range of 9 to 15 nm. Sample annealed at 400 °C displayed the lowest microstrain (0.262) and crystallinity (60%). FESEM images disclosed dense, homogeneous and crack free growth of annealed samples compared to as-deposited one. EDX spectra detected the right elemental compositions of films. AFM images showed growth evolution of YSZ grains with size range between 0.2 to 5 nm and improved films’ surface roughness. HRTEM measurement of the studied YSZTFs exhibited lattice orientation and atomic structure of nucleated YSZ nanocrystallites. Furthermore, film annealed at 500 °C divulged less oriented structure because of dislocation. |
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format | Article |
id | doaj.art-0ad25bb9bf6b42ac817d86ce637e54e1 |
institution | Directory Open Access Journal |
issn | 2053-1591 |
language | English |
last_indexed | 2024-03-12T15:35:59Z |
publishDate | 2020-01-01 |
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series | Materials Research Express |
spelling | doaj.art-0ad25bb9bf6b42ac817d86ce637e54e12023-08-09T16:12:50ZengIOP PublishingMaterials Research Express2053-15912020-01-017505640610.1088/2053-1591/ab9039Annealing temperature induced improved crystallinity of YSZ thin filmN A Rusli0https://orcid.org/0000-0002-6114-621XR Muhammad1S K Ghoshal2H Nur3N Nayan4https://orcid.org/0000-0002-9962-5283Department of Physics, Faculty of Science, Universiti Teknologi Malaysia UTM , 81310, Skudai, Johor Bahru, MalaysiaDepartment of Physics, Faculty of Science, Universiti Teknologi Malaysia UTM , 81310, Skudai, Johor Bahru, MalaysiaDepartment of Physics, Faculty of Science, Universiti Teknologi Malaysia UTM , 81310, Skudai, Johor Bahru, MalaysiaCentre for Sustainable Nanomaterials, Ibnu Sina Institute for Scientific and Industrial Research Universiti Teknologi Malaysia UTM, 81310, Skudai Johor Bahru, MalaysiaMicroelectronics and Nanotechnology—Shamsuddin Centre of Excellence, Universiti Tun Hussein Onn Malaysia , 86400 UTHM Batu Pahat, Johor, MalaysiaSix YSZ thin films (YSZTFs) were prepared at varied annealing temperature (380 °C to 600 °C) by radio frequency magnetron sputtering method. Glancing angle x-ray diffraction (GAXRD) pattern revealed the polycrystalline nature of all films with crystallite size in the range of 9 to 15 nm. Sample annealed at 400 °C displayed the lowest microstrain (0.262) and crystallinity (60%). FESEM images disclosed dense, homogeneous and crack free growth of annealed samples compared to as-deposited one. EDX spectra detected the right elemental compositions of films. AFM images showed growth evolution of YSZ grains with size range between 0.2 to 5 nm and improved films’ surface roughness. HRTEM measurement of the studied YSZTFs exhibited lattice orientation and atomic structure of nucleated YSZ nanocrystallites. Furthermore, film annealed at 500 °C divulged less oriented structure because of dislocation.https://doi.org/10.1088/2053-1591/ab9039YSZ thin filmannealing temperaturemicrostrainmorphologysurface roughnessstructural |
spellingShingle | N A Rusli R Muhammad S K Ghoshal H Nur N Nayan Annealing temperature induced improved crystallinity of YSZ thin film Materials Research Express YSZ thin film annealing temperature microstrain morphology surface roughness structural |
title | Annealing temperature induced improved crystallinity of YSZ thin film |
title_full | Annealing temperature induced improved crystallinity of YSZ thin film |
title_fullStr | Annealing temperature induced improved crystallinity of YSZ thin film |
title_full_unstemmed | Annealing temperature induced improved crystallinity of YSZ thin film |
title_short | Annealing temperature induced improved crystallinity of YSZ thin film |
title_sort | annealing temperature induced improved crystallinity of ysz thin film |
topic | YSZ thin film annealing temperature microstrain morphology surface roughness structural |
url | https://doi.org/10.1088/2053-1591/ab9039 |
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