Annealing temperature induced improved crystallinity of YSZ thin film

Six YSZ thin films (YSZTFs) were prepared at varied annealing temperature (380 °C to 600 °C) by radio frequency magnetron sputtering method. Glancing angle x-ray diffraction (GAXRD) pattern revealed the polycrystalline nature of all films with crystallite size in the range of 9 to 15 nm. Sample anne...

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Main Authors: N A Rusli, R Muhammad, S K Ghoshal, H Nur, N Nayan
Format: Article
Language:English
Published: IOP Publishing 2020-01-01
Series:Materials Research Express
Subjects:
Online Access:https://doi.org/10.1088/2053-1591/ab9039
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author N A Rusli
R Muhammad
S K Ghoshal
H Nur
N Nayan
author_facet N A Rusli
R Muhammad
S K Ghoshal
H Nur
N Nayan
author_sort N A Rusli
collection DOAJ
description Six YSZ thin films (YSZTFs) were prepared at varied annealing temperature (380 °C to 600 °C) by radio frequency magnetron sputtering method. Glancing angle x-ray diffraction (GAXRD) pattern revealed the polycrystalline nature of all films with crystallite size in the range of 9 to 15 nm. Sample annealed at 400 °C displayed the lowest microstrain (0.262) and crystallinity (60%). FESEM images disclosed dense, homogeneous and crack free growth of annealed samples compared to as-deposited one. EDX spectra detected the right elemental compositions of films. AFM images showed growth evolution of YSZ grains with size range between 0.2 to 5 nm and improved films’ surface roughness. HRTEM measurement of the studied YSZTFs exhibited lattice orientation and atomic structure of nucleated YSZ nanocrystallites. Furthermore, film annealed at 500 °C divulged less oriented structure because of dislocation.
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spelling doaj.art-0ad25bb9bf6b42ac817d86ce637e54e12023-08-09T16:12:50ZengIOP PublishingMaterials Research Express2053-15912020-01-017505640610.1088/2053-1591/ab9039Annealing temperature induced improved crystallinity of YSZ thin filmN A Rusli0https://orcid.org/0000-0002-6114-621XR Muhammad1S K Ghoshal2H Nur3N Nayan4https://orcid.org/0000-0002-9962-5283Department of Physics, Faculty of Science, Universiti Teknologi Malaysia UTM , 81310, Skudai, Johor Bahru, MalaysiaDepartment of Physics, Faculty of Science, Universiti Teknologi Malaysia UTM , 81310, Skudai, Johor Bahru, MalaysiaDepartment of Physics, Faculty of Science, Universiti Teknologi Malaysia UTM , 81310, Skudai, Johor Bahru, MalaysiaCentre for Sustainable Nanomaterials, Ibnu Sina Institute for Scientific and Industrial Research Universiti Teknologi Malaysia UTM, 81310, Skudai Johor Bahru, MalaysiaMicroelectronics and Nanotechnology—Shamsuddin Centre of Excellence, Universiti Tun Hussein Onn Malaysia , 86400 UTHM Batu Pahat, Johor, MalaysiaSix YSZ thin films (YSZTFs) were prepared at varied annealing temperature (380 °C to 600 °C) by radio frequency magnetron sputtering method. Glancing angle x-ray diffraction (GAXRD) pattern revealed the polycrystalline nature of all films with crystallite size in the range of 9 to 15 nm. Sample annealed at 400 °C displayed the lowest microstrain (0.262) and crystallinity (60%). FESEM images disclosed dense, homogeneous and crack free growth of annealed samples compared to as-deposited one. EDX spectra detected the right elemental compositions of films. AFM images showed growth evolution of YSZ grains with size range between 0.2 to 5 nm and improved films’ surface roughness. HRTEM measurement of the studied YSZTFs exhibited lattice orientation and atomic structure of nucleated YSZ nanocrystallites. Furthermore, film annealed at 500 °C divulged less oriented structure because of dislocation.https://doi.org/10.1088/2053-1591/ab9039YSZ thin filmannealing temperaturemicrostrainmorphologysurface roughnessstructural
spellingShingle N A Rusli
R Muhammad
S K Ghoshal
H Nur
N Nayan
Annealing temperature induced improved crystallinity of YSZ thin film
Materials Research Express
YSZ thin film
annealing temperature
microstrain
morphology
surface roughness
structural
title Annealing temperature induced improved crystallinity of YSZ thin film
title_full Annealing temperature induced improved crystallinity of YSZ thin film
title_fullStr Annealing temperature induced improved crystallinity of YSZ thin film
title_full_unstemmed Annealing temperature induced improved crystallinity of YSZ thin film
title_short Annealing temperature induced improved crystallinity of YSZ thin film
title_sort annealing temperature induced improved crystallinity of ysz thin film
topic YSZ thin film
annealing temperature
microstrain
morphology
surface roughness
structural
url https://doi.org/10.1088/2053-1591/ab9039
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