Microwave sintering of Ag-nanoparticle thin films on a polyimide substrate
Ag-nanoparticle thin films on a polyimide substrate were subjected to microwave sintering by use of a single-mode waveguide applicator. A two-step sintering process was employed. First, at low conductivities of the film, the film sample was placed at the site of the maximum electric field and subjec...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
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AIP Publishing LLC
2015-12-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4939095 |
| _version_ | 1811314895462858752 |
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| author | S. Fujii S. Kawamura D. Mochizuki M. M. Maitani E. Suzuki Y. Wada |
| author_facet | S. Fujii S. Kawamura D. Mochizuki M. M. Maitani E. Suzuki Y. Wada |
| author_sort | S. Fujii |
| collection | DOAJ |
| description | Ag-nanoparticle thin films on a polyimide substrate were subjected to microwave sintering by use of a single-mode waveguide applicator. A two-step sintering process was employed. First, at low conductivities of the film, the film sample was placed at the site of the maximum electric field and subjected to microwave irradiation. Second, when the conductivity of the film increased, the film sample was placed at the site of the maximum magnetic field and again subjected to microwave irradiation. The microwave sintering process was completed within 1.5 min, which is significantly lower than the time required for the oven heating process. The resulting conductivity of the film, albeit only 30% of that of the bulk material, was seven times that of a film annealed at the same temperature in a furnace. Scanning electron microscopy images revealed that the nanoparticles underwent both grain necking and grain growth during microwave sintering. In addition, this sintering process was equivalent to the oven heating process performed at a 50 °C higher annealing temperature. An electromagnetic wave simulation and a heat transfer simulation of the microwave sintering process were performed to gain a thorough understanding of the process. |
| first_indexed | 2024-04-13T11:20:34Z |
| format | Article |
| id | doaj.art-0c013d107c074605b2c986ed86aaae4c |
| institution | Directory Open Access Journal |
| issn | 2158-3226 |
| language | English |
| last_indexed | 2024-04-13T11:20:34Z |
| publishDate | 2015-12-01 |
| publisher | AIP Publishing LLC |
| record_format | Article |
| series | AIP Advances |
| spelling | doaj.art-0c013d107c074605b2c986ed86aaae4c2022-12-22T02:48:50ZengAIP Publishing LLCAIP Advances2158-32262015-12-01512127226127226-1110.1063/1.4939095055512ADVMicrowave sintering of Ag-nanoparticle thin films on a polyimide substrateS. Fujii0S. Kawamura1D. Mochizuki2M. M. Maitani3E. Suzuki4Y. Wada5Department of Applied Chemistry, Tokyo Institute of Technology, Tokyo 152-8522, JapanDepartment of Applied Chemistry, Tokyo Institute of Technology, Tokyo 152-8522, JapanInterdisciplinary Cluster for Cutting Edge Research, Center for Energy and Environmental Science, Shinshu University, Ueda, Nagano 386-8567, JapanDepartment of Applied Chemistry, Tokyo Institute of Technology, Tokyo 152-8522, JapanDepartment of Applied Chemistry, Tokyo Institute of Technology, Tokyo 152-8522, JapanDepartment of Applied Chemistry, Tokyo Institute of Technology, Tokyo 152-8522, JapanAg-nanoparticle thin films on a polyimide substrate were subjected to microwave sintering by use of a single-mode waveguide applicator. A two-step sintering process was employed. First, at low conductivities of the film, the film sample was placed at the site of the maximum electric field and subjected to microwave irradiation. Second, when the conductivity of the film increased, the film sample was placed at the site of the maximum magnetic field and again subjected to microwave irradiation. The microwave sintering process was completed within 1.5 min, which is significantly lower than the time required for the oven heating process. The resulting conductivity of the film, albeit only 30% of that of the bulk material, was seven times that of a film annealed at the same temperature in a furnace. Scanning electron microscopy images revealed that the nanoparticles underwent both grain necking and grain growth during microwave sintering. In addition, this sintering process was equivalent to the oven heating process performed at a 50 °C higher annealing temperature. An electromagnetic wave simulation and a heat transfer simulation of the microwave sintering process were performed to gain a thorough understanding of the process.http://dx.doi.org/10.1063/1.4939095 |
| spellingShingle | S. Fujii S. Kawamura D. Mochizuki M. M. Maitani E. Suzuki Y. Wada Microwave sintering of Ag-nanoparticle thin films on a polyimide substrate AIP Advances |
| title | Microwave sintering of Ag-nanoparticle thin films on a polyimide substrate |
| title_full | Microwave sintering of Ag-nanoparticle thin films on a polyimide substrate |
| title_fullStr | Microwave sintering of Ag-nanoparticle thin films on a polyimide substrate |
| title_full_unstemmed | Microwave sintering of Ag-nanoparticle thin films on a polyimide substrate |
| title_short | Microwave sintering of Ag-nanoparticle thin films on a polyimide substrate |
| title_sort | microwave sintering of ag nanoparticle thin films on a polyimide substrate |
| url | http://dx.doi.org/10.1063/1.4939095 |
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