The At-Wavelength Metrology Facility at BESSY-II
The At-Wavelength Metrology Facility at BESSY-II is dedicated to short-term characterization of novel UV, EUV and XUV optical elements, such as diffraction gratings, mirrors, multilayers and nano-optical devices like reflection zone plates. It consists of an Optics Beamline PM-1 and a Reflectometer...
Main Authors: | Franz Schäfers, Andrey Sokolov |
---|---|
Format: | Article |
Language: | English |
Published: |
Forschungszentrum Jülich
2016-02-01
|
Series: | Journal of large-scale research facilities JLSRF |
Online Access: | http://jlsrf.org/index.php/lsf/article/view/72 |
Similar Items
-
POLARIMETER: A Soft X-Ray 8-Axis UHV-Diffractometer at BESSY II
by: Andrey Sokolov, et al.
Published: (2016-11-01) -
The crystal monochromator beamline KMC-1 at BESSY II
by: Franz Schäfers
Published: (2016-11-01) -
The FemtoSpeX facility at BESSY II
by: Niko Pontius, et al.
Published: (2016-02-01) -
The PM3 beamline at BESSY II
by: Torsten Kachel
Published: (2016-02-01) -
The Nanocluster Trap endstation at BESSY II
by: Tobias Lau
Published: (2017-05-01)