Step Coverage and Dry Etching Process Improvement of Amorphous Carbon Hard Mask

Step Coverage and Dry Etching Process Improvement of Amorphous Carbon Hard Mask

Amorphous carbon hard mask (ACHM) films have been widely applied as protective components and hard etching masks in lithography and dry etching processes. The capability of lithography is directly dependent on the step coverage (SC) of the ACHM. Poor SC may impact the protection of device patterns d...

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Bibliographic Details
Main Authors: Zheng Jiang, Hao Zhu, Qingqing Sun, Davidwei Zhang
Format: Article
Language:English
Published: MDPI AG 2021-10-01
Series:Electronics
Subjects:
amorphous carbon hard mask
step coverage
dry etching
lithography
surface roughness
Online Access:https://www.mdpi.com/2079-9292/10/20/2512

Internet

https://www.mdpi.com/2079-9292/10/20/2512

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