Step Coverage and Dry Etching Process Improvement of Amorphous Carbon Hard Mask
Amorphous carbon hard mask (ACHM) films have been widely applied as protective components and hard etching masks in lithography and dry etching processes. The capability of lithography is directly dependent on the step coverage (SC) of the ACHM. Poor SC may impact the protection of device patterns d...
Main Authors: | Zheng Jiang, Hao Zhu, Qingqing Sun, Davidwei Zhang |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2021-10-01
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Series: | Electronics |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-9292/10/20/2512 |
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