Photo-activated polymerization inhibition process in photoinitiator systems for high-throughput 3D nanoprinting
The systems for multiphoton 3D nanoprinting are rapidly increasing in print speed for larger throughput and scale, unfortunately without also improvement in resolution. Separately, the process of photoinhibition lithography has been demonstrated to enhance the resolution of multiphoton printing thro...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2023-01-01
|
| Series: | Nanophotonics |
| Subjects: | |
| Online Access: | https://doi.org/10.1515/nanoph-2022-0611 |
| _version_ | 1797788983267164160 |
|---|---|
| author | Somers Paul Liang Zihao Chi Teng Johnson Jason E. Pan Liang Boudouris Bryan W. Xu Xianfan |
| author_facet | Somers Paul Liang Zihao Chi Teng Johnson Jason E. Pan Liang Boudouris Bryan W. Xu Xianfan |
| author_sort | Somers Paul |
| collection | DOAJ |
| description | The systems for multiphoton 3D nanoprinting are rapidly increasing in print speed for larger throughput and scale, unfortunately without also improvement in resolution. Separately, the process of photoinhibition lithography has been demonstrated to enhance the resolution of multiphoton printing through the introduction of a secondary laser source. The photo-chemical dynamics and interactions for achieving photoinhibition in the various multiphoton photoinitiator systems are complex and still not well understood. Here, we examine the photoinhibition process of the common photoinitiator 7-diethylamino 3-thenoylcoumarin (DETC) with inhibition lasers near or at the multiphoton printing laser wavelength in typical low peak intensity, high repetition rate 3D nanoprinting processes. We demonstrate the clear inhibition of the polymerization process consistent with a triplet absorption deactivation mechanism for a DETC photoresist as well as show inhibition for several other photoresist systems. Additionally, we explore options to recover the photoinhibition process when printing with high intensity, low repetition rate lasers. Finally, we demonstrate photoinhibition in a projection multiphoton printing system. This investigation of photoinhibition lithography with common photoinitiators elucidates the possibility for photoinhibition occurring in many resist systems with typical high repetition rate multiphoton printing lasers as well as for high-speed projection multiphoton printing. |
| first_indexed | 2024-03-13T01:44:19Z |
| format | Article |
| id | doaj.art-0db39296ed41441192eb684fa53da5fa |
| institution | Directory Open Access Journal |
| issn | 2192-8606 2192-8614 |
| language | English |
| last_indexed | 2024-03-13T01:44:19Z |
| publishDate | 2023-01-01 |
| publisher | De Gruyter |
| record_format | Article |
| series | Nanophotonics |
| spelling | doaj.art-0db39296ed41441192eb684fa53da5fa2023-07-03T10:20:08ZengDe GruyterNanophotonics2192-86062192-86142023-01-011281571158010.1515/nanoph-2022-0611Photo-activated polymerization inhibition process in photoinitiator systems for high-throughput 3D nanoprintingSomers Paul0Liang Zihao1Chi Teng2Johnson Jason E.3Pan Liang4Boudouris Bryan W.5Xu Xianfan6School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN47907, USACharles D. Davidson School of Chemical Engineering, Purdue University, West Lafayette, IN47907, USADepartment of Chemistry, Purdue University, West Lafayette, IN47907, USASchool of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN47907, USASchool of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN47907, USACharles D. Davidson School of Chemical Engineering and Department of Chemistry, Purdue University, West Lafayette, IN47907, USASchool of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN47907, USAThe systems for multiphoton 3D nanoprinting are rapidly increasing in print speed for larger throughput and scale, unfortunately without also improvement in resolution. Separately, the process of photoinhibition lithography has been demonstrated to enhance the resolution of multiphoton printing through the introduction of a secondary laser source. The photo-chemical dynamics and interactions for achieving photoinhibition in the various multiphoton photoinitiator systems are complex and still not well understood. Here, we examine the photoinhibition process of the common photoinitiator 7-diethylamino 3-thenoylcoumarin (DETC) with inhibition lasers near or at the multiphoton printing laser wavelength in typical low peak intensity, high repetition rate 3D nanoprinting processes. We demonstrate the clear inhibition of the polymerization process consistent with a triplet absorption deactivation mechanism for a DETC photoresist as well as show inhibition for several other photoresist systems. Additionally, we explore options to recover the photoinhibition process when printing with high intensity, low repetition rate lasers. Finally, we demonstrate photoinhibition in a projection multiphoton printing system. This investigation of photoinhibition lithography with common photoinitiators elucidates the possibility for photoinhibition occurring in many resist systems with typical high repetition rate multiphoton printing lasers as well as for high-speed projection multiphoton printing.https://doi.org/10.1515/nanoph-2022-06113d nanoprintingphotoinhibitionprojection multiphoton lithographytriplet absorption |
| spellingShingle | Somers Paul Liang Zihao Chi Teng Johnson Jason E. Pan Liang Boudouris Bryan W. Xu Xianfan Photo-activated polymerization inhibition process in photoinitiator systems for high-throughput 3D nanoprinting Nanophotonics 3d nanoprinting photoinhibition projection multiphoton lithography triplet absorption |
| title | Photo-activated polymerization inhibition process in photoinitiator systems for high-throughput 3D nanoprinting |
| title_full | Photo-activated polymerization inhibition process in photoinitiator systems for high-throughput 3D nanoprinting |
| title_fullStr | Photo-activated polymerization inhibition process in photoinitiator systems for high-throughput 3D nanoprinting |
| title_full_unstemmed | Photo-activated polymerization inhibition process in photoinitiator systems for high-throughput 3D nanoprinting |
| title_short | Photo-activated polymerization inhibition process in photoinitiator systems for high-throughput 3D nanoprinting |
| title_sort | photo activated polymerization inhibition process in photoinitiator systems for high throughput 3d nanoprinting |
| topic | 3d nanoprinting photoinhibition projection multiphoton lithography triplet absorption |
| url | https://doi.org/10.1515/nanoph-2022-0611 |
| work_keys_str_mv | AT somerspaul photoactivatedpolymerizationinhibitionprocessinphotoinitiatorsystemsforhighthroughput3dnanoprinting AT liangzihao photoactivatedpolymerizationinhibitionprocessinphotoinitiatorsystemsforhighthroughput3dnanoprinting AT chiteng photoactivatedpolymerizationinhibitionprocessinphotoinitiatorsystemsforhighthroughput3dnanoprinting AT johnsonjasone photoactivatedpolymerizationinhibitionprocessinphotoinitiatorsystemsforhighthroughput3dnanoprinting AT panliang photoactivatedpolymerizationinhibitionprocessinphotoinitiatorsystemsforhighthroughput3dnanoprinting AT boudourisbryanw photoactivatedpolymerizationinhibitionprocessinphotoinitiatorsystemsforhighthroughput3dnanoprinting AT xuxianfan photoactivatedpolymerizationinhibitionprocessinphotoinitiatorsystemsforhighthroughput3dnanoprinting |