Design of four-layer tri-wavelength silica antireflective coatings with vector method containing absentee layer

A four-layer tri-wavelength silica antireflective (AR) coating with 100% transmittance simultaneously at 1064 nm, 532 nm and 355 nm was designed based on the vector method combined with absentee layer. The type of this AR coating is λ/2-λ/4-λ/2-λ/4 (λ0 = 532 nm): 1.0|L A1 H A2|1.46 with nL = 1.19, n...

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Main Authors: Wensheng Lin, Xiaoyong Hu, Xueqing You, Lianghong Yan, Xinxiang Zhang, Hanxian Chen
Format: Article
Language:English
Published: Elsevier 2019-06-01
Series:Results in Physics
Online Access:http://www.sciencedirect.com/science/article/pii/S2211379718316322
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author Wensheng Lin
Xiaoyong Hu
Xueqing You
Lianghong Yan
Xinxiang Zhang
Hanxian Chen
author_facet Wensheng Lin
Xiaoyong Hu
Xueqing You
Lianghong Yan
Xinxiang Zhang
Hanxian Chen
author_sort Wensheng Lin
collection DOAJ
description A four-layer tri-wavelength silica antireflective (AR) coating with 100% transmittance simultaneously at 1064 nm, 532 nm and 355 nm was designed based on the vector method combined with absentee layer. The type of this AR coating is λ/2-λ/4-λ/2-λ/4 (λ0 = 532 nm): 1.0|L A1 H A2|1.46 with nL = 1.19, nA1 = 1.31, nH = 1.44 and nA2 = 1.33. Keywords: Antireflective coating, Tri-wavelength, Vector design, Absentee layer
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spelling doaj.art-0dc261a4039c42a69b6e2b9f95c92ab42022-12-22T02:09:58ZengElsevierResults in Physics2211-37972019-06-0113Design of four-layer tri-wavelength silica antireflective coatings with vector method containing absentee layerWensheng Lin0Xiaoyong Hu1Xueqing You2Lianghong Yan3Xinxiang Zhang4Hanxian Chen5College of Materials Engineering, Fujian Agriculture and Forestry University, 350002 Fuzhou, ChinaCollege of Materials Engineering, Fujian Agriculture and Forestry University, 350002 Fuzhou, ChinaCollege of Materials Engineering, Fujian Agriculture and Forestry University, 350002 Fuzhou, ChinaResearch Center of Laser Fusion, China Academy of Engineering Physical, Mianyang 621900, ChinaCollege of Materials Engineering, Fujian Agriculture and Forestry University, 350002 Fuzhou, China; Corresponding authors.College of Materials Engineering, Fujian Agriculture and Forestry University, 350002 Fuzhou, China; Corresponding authors.A four-layer tri-wavelength silica antireflective (AR) coating with 100% transmittance simultaneously at 1064 nm, 532 nm and 355 nm was designed based on the vector method combined with absentee layer. The type of this AR coating is λ/2-λ/4-λ/2-λ/4 (λ0 = 532 nm): 1.0|L A1 H A2|1.46 with nL = 1.19, nA1 = 1.31, nH = 1.44 and nA2 = 1.33. Keywords: Antireflective coating, Tri-wavelength, Vector design, Absentee layerhttp://www.sciencedirect.com/science/article/pii/S2211379718316322
spellingShingle Wensheng Lin
Xiaoyong Hu
Xueqing You
Lianghong Yan
Xinxiang Zhang
Hanxian Chen
Design of four-layer tri-wavelength silica antireflective coatings with vector method containing absentee layer
Results in Physics
title Design of four-layer tri-wavelength silica antireflective coatings with vector method containing absentee layer
title_full Design of four-layer tri-wavelength silica antireflective coatings with vector method containing absentee layer
title_fullStr Design of four-layer tri-wavelength silica antireflective coatings with vector method containing absentee layer
title_full_unstemmed Design of four-layer tri-wavelength silica antireflective coatings with vector method containing absentee layer
title_short Design of four-layer tri-wavelength silica antireflective coatings with vector method containing absentee layer
title_sort design of four layer tri wavelength silica antireflective coatings with vector method containing absentee layer
url http://www.sciencedirect.com/science/article/pii/S2211379718316322
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