Implanted Layer Characterization
In modern semiconductor process technology, ion implantation has become the most important technique to introduce dopant atoms into semiconductor materials. The main advantage of ion implantation technique is its high controllability of process parameters, which influencing dopant distribution profi...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Departement of Electrical Engineering, Faculty of Engineering, Universitas Brawijaya
2016-06-01
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| Series: | Jurnal EECCIS (Electrics, Electronics, Communications, Controls, Informatics, Systems) |
| Subjects: | |
| Online Access: | https://jurnaleeccis.ub.ac.id/index.php/eeccis/article/view/351 |